研究目的
Investigating the enhancement of power conversion efficiencies in ferroelectric photovoltaics through thickness reduction and the Schottky barrier effect.
研究成果
The study demonstrates that reducing the thickness of ferroelectric films to be comparable with the depletion width can significantly enhance photovoltaic efficiency by suppressing recombination and lowering series resistance. This approach, based on the Schottky barrier effect, offers a promising pathway for developing high-efficiency, ultrathin-film photovoltaic devices.
研究不足
The study is limited to PZT films under UV illumination, and the applicability to other ferroelectric materials or under different light conditions is not explored. Additionally, the switchability of the photovoltaic effect in electrode-capped ultrathin films was not achieved.
1:Experimental Design and Method Selection:
The study involved the fabrication of PZT ultrathin films with varying thicknesses to investigate the Schottky barrier effect on photovoltaic performance.
2:Sample Selection and Data Sources:
PZT 20/80 epitaxial thin films were grown on SRO-buffered STO substrates using pulsed laser deposition.
3:List of Experimental Equipment and Materials:
Equipment included a KrF excimer laser for PLD, X-ray diffraction for structural analysis, and a ferroelectric workstation for electrical characterization.
4:Experimental Procedures and Operational Workflow:
Films were characterized for their ferroelectric, dielectric, and photovoltaic properties under UV illumination.
5:Data Analysis Methods:
The thickness-dependent photovoltaic characteristics were analyzed using a Schottky barrier model to understand the mechanisms behind the observed efficiencies.
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Ferroelectric workstation
Precision Multiferroic
Radiant
Used for measuring P–V hysteresis loops, C–V, and I–V characteristics.
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LCR meter
E4980A
Agilent
Used for inductance–capacitance–resistance measurements.
E4980A/E4980AL Precision LCR Meter
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Source meter
6430
Keithley
Used for electrical characterization.
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X-ray diffraction
X’Pert PRO
PANalytical
Used for examining the crystal structures and epitaxial qualities of the films.
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KrF excimer laser
λ = 248 nm
Used for pulsed laser deposition of PZT films.
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UV light-emitting diode
365 nm
Used for photovoltaic property measurements.
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