研究目的
To evaluate the chemical structure of thin films of EVA copolymer obtained for the first time by two different PVD methods, i.e., pulsed laser and pulsed electron beam deposition.
研究成果
The PED technique, which utilizes a pulsed electron beam to ablate the polymer, is a more convenient way to produce good quality thin polymer films compared to the PLD method. The EVA films produced using the PLD technique showed poorer quality in terms of chemical structure and film morphology. The study suggests that the PLD method is not as universal for polymer deposition as sometimes indicated, especially for complex materials like copolymers.
研究不足
The study focuses on the chemical structure and morphology of EVA films obtained by PED and PLD methods. The limitations include the specific conditions under which the films were deposited and the focus on EVA copolymer, which may not be generalizable to other polymers.
1：Experimental Design and Method Selection:
EVA copolymer coatings were deposited by means of a PED/PLD system. ATEVA4030AC copolymer was used with 40 wt% of vinyl acetate. The target material was prepared by injection molding. The EVA coatings were deposited on silicon (100) substrates.
2：Sample Selection and Data Sources:
The target material was a disc of 50 mm diameter and 10 mm height. The substrates were 10 × 10 mm silicon wafers.
3：List of Experimental Equipment and Materials:
PED/PLD system (NEOCERA, Inc.), pulse electron beam source (PEBS), excimer laser (Coherent CompexPro 201F; He/Ne;KrF, λ = 248 nm), Nikon MM-40 microscope, Hitachi SU-70 microscope, ATR-FTIR (Lumos, Bruker), X-ray photoelectron spectroscopy (Prevac system equipped with a Scienta SES 2002 electron energy analyzer).
4：Experimental Procedures and Operational Workflow:
Prior to film deposition, the substrates were cleaned. For PED, a pulse electron beam source was used at 12 kV. For PLD, an excimer laser with 20 ns pulse duration was used. Both techniques used a 5 Hz pulse repetition rate, 80 mm distance between the target and substrate, nitrogen as the background gas at a pressure of
5：93 Pa, and deposition time corresponding to 25,000 pulses. Data Analysis Methods:
The chemical structures of EVA films were characterized using ATR-FTIR and XPS. The surface morphology was evaluated by light microscopy and SEM.
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