研究目的
Investigating the controlled production of atomically thin nanowells in bilayer WS2 using an in situ heating holder combined with a focused electron beam in a scanning transmission electron microscope (STEM).
研究成果
The study demonstrates the precise fabrication of nanowells in bilayer WS2 with controlled spatial distributions and sizes, offering insights for the nanoengineering of nanowells in 2D TMDs. The mechanism of nanowell formation differs from that in monolayer films due to van der Waals interactions in the bilayer system.
研究不足
The study is limited by the precision of electron beam manipulation and the need for high temperatures to avoid carbon contamination, which may not be suitable for all applications.
1：Experimental Design and Method Selection:
The study utilized an in situ heating holder combined with a focused electron beam in a STEM to produce atomically thin nanowells in bilayer WS2. The methodology involved systematic study of the formation and evolvement mechanism of nanowells with precise control over their spatial distributions and sizes.
2：The methodology involved systematic study of the formation and evolvement mechanism of nanowells with precise control over their spatial distributions and sizes.
Sample Selection and Data Sources:
2. Sample Selection and Data Sources: Bilayer WS2 samples were grown by chemical vapor deposition (CVD) and transferred to a TEM chip for in situ heating experiments.
3：List of Experimental Equipment and Materials:
JEOL ARM-200F STEM with a cold field emission source (CFEG) Cs probe corrector, in situ heating holder (DENS Solutions, SH30-4M-FS), and Si3N4 heating TEM grid (DENS Solutions, DENS-C-30).
4：0).
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The sample was loaded on a heating TEM chip and heated up to 800 °C. ADF-STEM imaging and nanopores fabrication were conducted at 80 kV. The electron beam was confined in a small boxed region for higher dose irradiation to create nanowells.
5：Data Analysis Methods:
Image processing and simulations were conducted using ImageJ, CrystalMaker X, Accelrys Discovery Studio Visualizer software, and JEMS software for multislice process simulation.
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