1：Experimental Design and Method Selection:

The study involved the growth of polycrystalline (Bi1?xSrx)(Fe1?xTix)O3 thin films on Pt(111)/TiO2/SiO2/Si(100) substrates using chemical solution deposition technique. X-ray diffraction and Raman spectroscopy were used to analyze the structural properties. Photovoltaic measurements were conducted to study the photovoltaic response.

2：Sample Selection and Data Sources:

Samples with x = 0.0, 0.05, 0.10, and 0.20 were prepared. Data were collected from X-ray diffraction patterns, Raman spectra, and photovoltaic measurements.

3：0, 05, 10, and 20 were prepared. Data were collected from X-ray diffraction patterns, Raman spectra, and photovoltaic measurements. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: Rigaku smart lab X-ray spectrometer, Horiba LabRam spectroscopic instrument, Bentham PVE 300 diffused reflectance spectroscopy (DRS), Radiant Technology PMF0713-334 polarization loop tracer, piezo-response force microscopy (PFM) (Park system NX10), Keithley’s high resistance electrometer (6517B), Xenon arc lamp.

4：Experimental Procedures and Operational Workflow:

Thin films were grown, characterized by X-ray diffraction and Raman spectroscopy, and their photovoltaic properties were measured under various poling conditions.

5：Data Analysis Methods:

The data were analyzed to correlate the structural phase evolution and polarization with the photovoltaic response.