研究目的
Investigating the properties of boron-doped zinc oxide (BZO) films prepared by reactive sputtering method and their application in amorphous silicon thin film solar cells.
研究成果
The study successfully demonstrated the preparation of boron-doped zinc oxide (BZO) films with controlled opto-electronic properties by varying the gas concentration ratio in reactive sputtering. The optimized BZO films showed promising results when applied as transparent conducting oxide in amorphous silicon thin film solar cells, achieving an overall efficiency of 8.14%.
研究不足
The study is limited to the effects of varying the B2H6 gas concentration ratio on the properties of BZO films and their application in amorphous silicon thin film solar cells. The potential for optimization and application in other types of solar cells or optoelectronic devices is not explored.
1：Experimental Design and Method Selection:
BZO thin films were deposited on plain soda-lime glass substrates by RF magnetron sputtering method using a ceramic target made of ZnO of
2：99% purity. The gas flow in the sputtering chamber was controlled by using Mass flow controllers (MFCs). Sample Selection and Data Sources:
The percentage of 1% B2H6 in H2 gas in total gas flow was varied from
3：04 to List of Experimental Equipment and Materials:
RF magnetron sputtering system (Milman Thin Films Pvt Ltd, India), Mass flow controllers (MFCs), ceramic target made of ZnO, Argon (Ar) gas, 1% B2H6 in H2 gas.
4：Experimental Procedures and Operational Workflow:
The chamber pressure was maintained at 1×10-2 mbar during deposition. The gas flow in the sputtering chamber was controlled by using MFCs.
5：Data Analysis Methods:
The structural, electrical, and optical properties of the BZO films were characterized using X-ray Diffraction (XRD), Hall measurement system, spectrophotometer, Ellipsometer, FESEM, and AFM.
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Ellipsometer
ALPHA-SE series
J.A. Woollam
Determination of refractive indices
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X-ray Diffraction
X’PERT PRO
PANALYTICAL
Analysis of crystalline structure
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RF magnetron sputtering system
Milman Thin Films Pvt Ltd
Deposition of BZO thin films
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Mass flow controllers
Control of gas flow in the sputtering chamber
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Ceramic target
Sputtering target for deposition of BZO films
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Hall measurement system
HMS 5300
Ecopia
Measurement of electrical properties
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Spectrophotometer
Perkin Elmer
Analysis of optical properties
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FESEM
Zeiss
Characterization of surface morphologies
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AFM
NT-MDT
Characterization of surface morphologies
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Stylus profilometer
Dektak XT
Measurement of film thicknesses
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RF-PECVD system
HHV
Development of silicon based materials and fabrication of solar cells
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Solar simulator
PET photo emission Tech.INC
Measurement of J-V characteristics
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EQE measurement system
PVE-300
Bentham
Evaluation of spectral response
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