研究目的
Investigating the dynamic ionization process in internal modification of glass by ultrashort laser pulses at 532nm and 1064nm, focusing on the effects of laser wavelength on the ionization process and comparing crack tendencies between single pulse and multipulse irradiation.
研究成果
The study concludes that dynamic plasma motion in heat accumulation regime is dominated by multiphoton ionization at 532 nm and avalanche ionization at 1064 nm. The plasma moves toward the laser source periodically at 1064 nm due to the contribution of avalanche ionization strengthened by thermal ionization, while the plasma at 532 nm is more static. Crack tendency is higher at 532 nm at high pulse repetition rates, contrary to single pulse irradiation.
研究不足
The study assumes thermal properties are independent of temperature and neglects thermal radiation loss, which may affect the accuracy of temperature simulations. The alignment of the aspheric lens is not perfect, leading to larger laser spot radii than expected.
