研究目的
To investigate the potential application of the GaSe/VO2 vdW heterostructure for a novel temperature-sensitive photodetector, exploring the interaction between 2D materials and strongly correlated electronic materials for high-performance and unique optoelectronic applications.
研究成果
The GaSe/VO2 vdW heterostructure photodetector exhibits enhanced performance with high external quantum efficiency, responsivity, and detectivity. The photoresponse is highly sensitive to temperature, controlled by the metal-insulator transition of VO2, enabling unique optoelectronic applications. This study demonstrates the potential of combining 2D materials with strongly correlated electronic materials for advanced photodetection technologies.
研究不足
The study is limited by the trap states due to defects in GaSe flakes or VO2 film, which affect the photoresponse properties. The temperature-sensitive photoresponse is highly dependent on the metal-insulator transition of VO2, which may limit the device's operational temperature range.
1:Experimental Design and Method Selection:
The study involves the fabrication of a GaSe/VO2 mixed-dimensional vdW heterostructure using pulsed laser deposition (PLD), mechanical exfoliation, and dry transfer methods. The heterostructure's optoelectronic properties are characterized under various conditions.
2:Sample Selection and Data Sources:
The VO2 film is grown on a SiO2/p+-Si substrate, and GaSe flakes are exfoliated from bulk GaSe single crystals. The structural and electrical properties are analyzed using TEM, AFM, KPFM, and electrical measurements.
3:List of Experimental Equipment and Materials:
Equipment includes PLD system, TEM, AFM, KPFM, SEM, XPS, Raman spectrometer, and Keithley 4200-SCS system. Materials include VO2 powders, GaSe single crystals, and Ni/Au electrodes.
4:Experimental Procedures and Operational Workflow:
The VO2 film is deposited and annealed, GaSe flakes are exfoliated and transferred onto the VO2 film, and electrodes are fabricated using EBL and thermal evaporation. The device's electrical and optoelectronic properties are measured under varying temperatures and laser irradiation intensities.
5:Data Analysis Methods:
The data is analyzed to extract electrical characteristics, photoresponse properties, and band-structure evolution using sigmoidal function fitting, Poisson equation, and power law analysis.
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Atomic Force Microscopy
Bruker Dimension Icon
Bruker
Used to obtain the topographies of the VO2 films and GaSe/VO2 heterostructures, as well as the thicknesses of the exfoliated GaSe flakes.
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Kelvin Probe Force Microscopy
Bruker Dimension Icon
Bruker
Used to quantitatively characterize the surface potential of the GaSe/VO2 heterostructures.
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Transmission Electron Microscope
JEOL 2100F
JEOL
Used for observing the cross-sections of the GaSe/VO2 heterostructures.
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X-ray Diffractometer
Bruker D8 Advance
Bruker
Used to analyze the structural characteristics of the VO2 films at room temperature.
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X-ray Photoelectron Spectroscopy
PerkinElmer RBD upgraded PHI-5000C ESCA system
PerkinElmer
Used to analyze the valence states of the VO2 films.
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Keithley 4200-SCS system
4200-SCS
Keithley
Used to characterize the temperature dependent current-voltage and photoresponse properties.
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Thorlabs ITC4001
ITC4001
Thorlabs
Used to control the irradiation intensities of a 405 nm laser.
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Pulsed Laser Deposition System
TSST Customized
Used for growing the VO2 epitaxial film on the substrate.
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Scanning Electron Microscopy
Philips XL30FEG
Philips
Used to analyze the thicknesses and the valence states of the VO2 films.
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Raman Spectrometer
Jobin-Yvon LabRAM HR Evolution
Jobin-Yvon
Used to study the VO2 films and GaSe/VO2 heterostructures with a 532 nm laser.
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