摘要： Impacts of reactor pressure and growth temperature on the qualities and properties of InGaP epitaxial layers grown in a narrow-channel horizontal metalorganic vapor-phase epitaxy (MOVPE) reactor were investigated with a growth rate of 10 μm/h. The roughness of InGaP was improved remarkably when the pressure was increased from 6 to 10 and 15 kPa. The reason is most likely related to the absolute pressure of P and the migrations of In and Ga adatoms on the wafer surface. Owing to the gas-phase reactions and desorption of P from InGaP, the surface of InGaP became rough, and the pit dislocation was increased with an increase in growth temperature. Although a low temperature was beneficial in order to obtain a smooth InGaP surface, the carrier lifetime in InGaP was shortened as a drawback. Consequently, InGaP n-on-p solar cells grown at a low temperature suffered from the degradations of both short-circuit current density and open-circuit voltage. Background impurities and defect densities in low temperature grown InGaP were attributed to these deteriorations. At the optimized growth temperature of 650 °C and the reactor pressure of 15 kPa, the growth rate of InGaP was accelerated to 20 and 30 μm/h. InGaP solar cells were successfully fabricated with the rate of 30 μm/h that opened up the way for the fabrication of III–V multijunction solar cells in the high-speed MOVPE reactor.