1：Experimental Design and Method Selection:

The study utilized a chemical vapor deposition (CVD) system for the growth of WO3 nanowires without catalyst. The influence of growth conditions such as argon carrier gas flow rate and tube inner pressure on the morphology of WO3 nanowires was investigated.

2：Sample Selection and Data Sources:

WO3 powder (Sigma Aldrich, Purity 99.99%) was used as the precursor material. Growth substrates were 300 nm SiO2 on Si.

3：99%) was used as the precursor material. Growth substrates were 300 nm SiO2 on Si. List of Experimental Equipment and Materials:

3. List of Experimental Equipment and Materials: CVD system with a 1-inch diameter quartz tube, atomic force microscope (AFM, Witec alpha 300RA+), scanning electron microscope (SEM, FEI Verios 460L), high-resolution transmission electron microscope (HRTEM, FEI Titan G2 80-200 TEM/STEM), x-ray energy dispersive spectrometer (EDS, Oxford Instruments X-Max 80 EDS system).

4：Experimental Procedures and Operational Workflow:

The growth conditions were optimized to achieve ultra-long WO3 nanowires. The morphology and crystal structure of the nanowires were characterized using AFM, SEM, and HRTEM. Photodetectors were fabricated based on single WO3 nanowires and their performance was evaluated.

5：Data Analysis Methods:

The performance of the photodetectors was analyzed based on responsivity, detectivity, and response time under illumination.