研究目的
To investigate the effect of substrate temperature on the structural, optical, and electrical properties of Cadmium Sulphide (CdS) thin films deposited by RF magnetron sputtering for solar cell applications.
研究成果
The study demonstrated that substrate temperature significantly affects the structural, optical, and electrical properties of CdS thin films. Films deposited at 300 °C showed optimal properties for use as a window layer in thin-film solar cells.
研究不足
The study is limited to the effect of substrate temperature on CdS thin films deposited by RF sputtering. Other deposition parameters like RF power, gas flow, and deposition time were kept constant.
1:Experimental Design and Method Selection
The CdS thin films were deposited on borosilicate glass substrates using RF magnetron sputtering at different substrate temperatures (25–300 °C). The structural, morphological, optical, and electrical properties were characterized using XRD, FE-SEM, UV–VIS-NIR spectroscopy, and Hall Effect measurement.
2:Sample Selection and Data Sources
Standard borosilicate glass substrates were used. The substrates were cleaned mechanically and ultrasonically in a sequence of methanol, acetone, methanol, and deionized water.
3:List of Experimental Equipment and Materials
RF magnetron sputtering machine (NSC-3500, 2 guns), CdS target (99.99% purity), Quartz Crystal Deposition Monitor (QCM), Mass Flow Controller (MFC), Dektak stylus profilometer, BRUKER AXS-D8 diffractometer, Field Emission Scanning Electron Microscope (FE-SEM), PerkinElmer UV WinLab spectrometer, Hall Effect measurement system.
4:Experimental Procedures and Operational Workflow
The substrates were cleaned and mounted in the sputtering machine. CdS films were deposited under Argon ambient at different substrate temperatures. The thickness was monitored by QCM. Post-deposition, films were air annealed at 100 °C for 10 min. The properties were then characterized using various techniques.
5:Data Analysis Methods
XRD data was analyzed using Bragg’s law and Scherrer formula. Optical properties were analyzed using UV–VIS-NIR spectroscopy. Electrical properties were analyzed using Hall Effect measurements.
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UV–VIS-NIR spectrometer
UV WinLab
PerkinElmer
Optical properties analysis
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RF magnetron sputtering machine
NSC-3500
Deposition of CdS thin films
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Quartz Crystal Deposition Monitor
QCM
Monitoring film thickness during deposition
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Mass Flow Controller
MFC
Controlling the flow of Ar gas during deposition
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Dektak stylus profilometer
Measuring film thickness
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BRUKER AXS-D8 diffractometer
BRUKER
X-ray diffraction analysis
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Field Emission Scanning Electron Microscope
FE-SEM
Morphological analysis
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Hall Effect measurement system
Electrical properties analysis
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