研究目的
Investigating a novel lithography and etching-free strategy for the fabrication of patterned functional piezoelectric PZT films on pristine platinized silicon through inkjet-printed alkanethiolate-based templates.
研究成果
The study successfully demonstrates a lithography and etching-free method for patterning PZT piezoelectric thin films on platinized silicon using inkjet-printed alkanethiolate-based templates. The printed PZT structures exhibit functional ferroelectric and piezoelectric characteristics, suggesting the process as a viable alternative to conventional deposition methods for patterned metal oxide films on high surface energy metal substrates.
研究不足
The resolution achievable via inkjet printing is limited to the 10–100 μm range, dependent on the ink/substrate system. The process is more straightforward for squares and rectangles but challenging for concave polygons and shapes with feature sizes inferior to 1 mm and curved edges.
1：Experimental Design and Method Selection:
The study employs inkjet printing for the additive manufacturing of PZT films, utilizing a novel process that avoids lithography and etching. The methodology includes the formulation of jettable and stable inks, printing on platinized silicon substrates, and subsequent annealing steps.
2：Sample Selection and Data Sources:
Platinized silicon wafers are used as substrates. The study involves the preparation and characterization of templating and functional inks, followed by their deposition and analysis.
3：List of Experimental Equipment and Materials:
Includes a Ceradrop X-Serie inkjet printer, Dimatix DMC-11601 cartridges, and various chemicals for ink preparation such as 1-dodecanethiol, 2-methoxyethanol, and glycerol.
4：Experimental Procedures and Operational Workflow:
The process involves printing templating ink lines on platinized silicon, followed by PZT precursor ink deposition, drying, pyrolysis, and crystallization. The sequence is repeatable to increase film thickness.
5：Data Analysis Methods:
Characterization techniques include optical microscopy, profilometry, grazing incidence X-ray diffraction, scanning electron microscopy, and electromechanical characterization to assess ferroelectric and piezoelectric properties.
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