研究目的
Investigating the effect of substrate temperature on the morphological, structural, and optical properties of bismuth oxide thin films grown by pulsed laser deposition.
研究成果
The substrate temperature significantly influences the structural, morphological, and optical properties of bismuth oxide thin films. Higher temperatures improve crystallinity and transmittance but reduce the refractive index. The films exhibit potential for optoelectronic applications due to their complex energy band structures.
研究不足
The study is limited to the effects of substrate temperature on bismuth oxide thin films grown by PLD. Other deposition parameters and their interactions were not explored.
1：Experimental Design and Method Selection
Pulsed laser deposition (PLD) was used to grow bismuth oxide films on BK7 glass substrates at varying temperatures (300-600 °C) in a controlled oxygen atmosphere.
2：Sample Selection and Data Sources
High-quality BK7 glass slides were used as substrates. The films were characterized using X-ray diffractometry (XRD), atomic force microscopy (AFM), and spectrophotometry.
3：List of Experimental Equipment and Materials
UV nanosecond pulsed laser, pure bismuth target (99.99%, Sigma-Aldrich), MII-4 Linnik-type interferential microscope, DRON-3 diffractometer, Perkin Elmer Lambda 35 spectrophotometer.
4：Experimental Procedures and Operational Workflow
Substrates were cleaned and heated to the desired temperature. Films were deposited using PLD, then characterized for thickness, structure, morphology, and optical properties.
5：Data Analysis Methods
XRD for structural analysis, AFM for morphological studies, spectrophotometry for optical properties, and the Wemple-DiDomenico model for energy bandgap and dispersion energy calculations.
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