研究目的
Investigating the use of wavelet transform for estimating the thickness of layers and their order in a film density profile based on X-ray and synchrotron reflectometry data.
研究成果
The study concludes that wavelet transform is effective for analyzing X-ray reflectometry data of thin films, proposing methods to minimize distortions and enhance the reliability of film structure models. It emphasizes the importance of considering measurement interval finiteness and sample quality in analysis.
研究不足
The study acknowledges distortions in the ACF and WT plots due to the finiteness of angular measurement interval and suggests ways to reduce them. It also notes that additional distortions may arise from sample quality issues like interface roughness and layer disorder.
1：Experimental Design and Method Selection:
The study employs wavelet transform to analyze X-ray and synchrotron reflectometry data for estimating film layer thickness and order.
2：Sample Selection and Data Sources:
A multilayered box model of film profile is used to demonstrate the method.
3：List of Experimental Equipment and Materials:
X-ray and synchrotron radiation sources are implied, though not explicitly listed.
4：Experimental Procedures and Operational Workflow:
The methodology involves constructing wavelet transforms for reflectograms and plotting dependences of X-ray attenuation length on grazing incidence angle.
5：Data Analysis Methods:
Wavelet analysis is used to interpret the reflectometry data, focusing on the spatial signal delay in waveletgrams.
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