摘要： Scanning probe lithography based on local anodic oxidation (LAO) provides a robust and general nanolithography tool for a wide range of applications. Its practical use, however, has been strongly hampered due to the requirement of a pre-fabricated micro-electrode to conduct the driving electrical current. Here we report a novel electrode-free LAO technique, which enables in-situ patterning of as-prepared low-dimensional materials and heterostructures with great flexibility and high precision. Unlike conventional LAO driven by a DC current, the electrode-free LAO is driven by a high-frequency (>10 kHz) AC current applied through capacitive coupling, which eliminates the need of a contacting electrode and can be used even for tailoring insulating materials. Using this technique, we demonstrated flexible nanolithography of graphene, hexagonal boron nitride (hBN), and carbon nanotubes (CNTs) on insulating substrates with ~10-nanometer precision. In addition, the electrode-free LAO exhibits high etching quality without oxide residues left. Such an in-situ and electrode-free nanolithography with high etching quality opens up new opportunities for fabricating ultraclean nanoscale devices and heterostructures with great flexibility.