研究目的
Investigating the reflection coefficient of HfO2-based RRAM in different resistance states to understand the switching mechanisms and extend their applications in radio frequencies and potential microwave switching domains.
研究成果
The study demonstrated that switching RRAM devices to different resistance states can alter their reflection coefficients, with lower resistance states showing higher reflection. This behavior is attributed to the metallic nature of the conductive filament in low resistance states. Scaling down device sizes could enable reflection switching in the microwave region, suggesting potential applications in tunable waveguides.
研究不足
The study was limited to observing reflection coefficients in the low RF region. Achieving reflection in the microwave frequency region requires scaling down device sizes to the nanoscale, which was not fully explored.
1:Experimental Design and Method Selection:
The study involved measuring impedance spectra of RRAM devices in different resistive states to extract reflection coefficients. Theoretical models based on Lorentz dispersion were used to analyze the data.
2:Sample Selection and Data Sources:
RRAM devices with a stack of Ru/HfO2/Zr/W were fabricated on an oxidized p-Si wafer. Devices of various sizes were tested to observe size effects on reflection characteristics.
3:List of Experimental Equipment and Materials:
A Cascade Microtech MPS150 Probe Station connected to a Keithley 4200 semiconductor characterization system with a 4210 Capacitance Voltage Unit was used for electrical measurements.
4:Experimental Procedures and Operational Workflow:
Devices were subjected to electroforming, set, and reset processes to achieve different resistive states. Impedance spectra were measured over a frequency range of 1 kHz to 10 MHz.
5:Data Analysis Methods:
Complex permittivity was derived from measured capacitance and conductance, and reflection coefficients were calculated using refractive index and extinction coefficient derived from permittivity.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容