研究目的
Investigating the effect of structural arrangement, position, and orientation of particles on the resulting haze factor in particulate thin films.
研究成果
Ordered structures with defined distances between individual scattering elements dominated minimal haze structures, while particle chains and dense clusters were found in structures with maximal haze. These findings enable tailoring the optical properties in particulate thin films and model transparent electrodes.
研究不足
The numerical computation of the haze factor is challenging due to the discrepancy of scales between the optical properties at the individual particle level and the far field property. The optimization can be trapped in local minima.
1:Experimental Design and Method Selection:
A mathematical optimization model was designed to iteratively alter the particle layer structure to maximize or minimize the haze factor. Colloidal self-assembly techniques were used to replicate particle structures found in optimized designs.
2:Sample Selection and Data Sources:
Spherical polystyrene particles with a refractive index n = 1.5959 and a diameter of d = 245 nm were used in a surrounding medium with n = 1. The sample was illuminated by a plane wave with a wavelength of λ = 550 nm.
3:5959 and a diameter of d = 245 nm were used in a surrounding medium with n = The sample was illuminated by a plane wave with a wavelength of λ = 550 nm.
List of Experimental Equipment and Materials:
3. List of Experimental Equipment and Materials: Polystyrene particles, block copolymer poly(methyl methacrylate)-block-poly(acrylic acid) (PMMA15-PAA15), glass substrates, silver for nanohole films.
4:Experimental Procedures and Operational Workflow:
Colloidal monolayers were fabricated using a Langmuir trough, transferred to glass substrates, and characterized. Metal nanohole films were prepared by colloidal lithography.
5:Data Analysis Methods:
The haze factor was computed from the angle-dependent far field scattering. Scanning electron microscopy and UV-VIS spectrophotometry were used for characterization.
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