研究目的
To report the process to obtain a metal-insulator-semiconductor (MIS) structure based on ZnO nanostructures grown on the surface of an anodized aluminum substrate (Al2O3/Al) by chemical routes.
研究成果
It is possible to construct a MIS type structure from chemical (electrochemical and hydrothermal) routes. These methods are characterized by using mild reaction conditions, being fast, low cost and easy processing, making possible their scaling. The study of the electropolished surface of the metal substrate (Al) by metallographic analysis shows a uniform surface, with no apparent roughness.
研究不足
The study does not mention specific limitations, but potential areas for optimization could include the scalability of the chemical routes and the uniformity of the nanostructures.
