研究目的
The effluence of Bi3+ doping on the microstructure and property of the undoped and Bi3+-doped Cu2Se films deposited by chemical bath deposition.
研究成果
Bi-doping effect on the microstructural, optical and electrical properties of the Cu2Se films was studied. The films had the Cu/Se ratio larger than the stoichiometric ratio of the Cu2Se and showed a decreased resistance of ~4.13-96.44×10-3 Ω·cm with increasing Bi content. The films with the thickness of ~530-750 nm showed average transmittances of ~73.29-84.10 % in 300-850 nm. The bandgaps increased with the increase of Bi/Cu ratio from 0 to 0.136 because of Moss-Burstein effect and possibly wider bulk bandgap of Bi2Se3 than Cu2Se. The strong emission centered at ~629 nm related to bandgap or near bandgap emission was also observed.
研究不足
The study focuses on the effect of Bi3+ doping on Cu2Se films deposited by chemical bath deposition. The limitations include the specific conditions of deposition and characterization methods used, which may not be applicable to other deposition techniques or materials.
1：Experimental Design and Method Selection:
Chemical bath deposition was used to deposit undoped and Bi3+-doped Cu2Se films. The effect of Se/Cu molar ratio and Bi3+ content on the microstructural, optical, and electrical properties of the deposited Cu2Se films was studied.
2：Sample Selection and Data Sources:
Commercial glass slides were used as substrates. The films were characterized using XRD, SEM, XPS, UV-vis spectrophotometer, luminescent spectrophotometer, and a 4-point probes resistance system.
3：List of Experimental Equipment and Materials:
X-ray diffractometer (XRD, Model No: D/Max-2200PC), scanning electron microscopy (SEM, Model No: S-4800), film thickness measuring instrument (Model No: CHY-CB), X-ray photo-electron spectroscopy (XPS, Model no: Axis Ultradld), UV-vis spectrophotometer (Model No: UV2600), luminescent spectrophotometer (Model no: FluoroMax-4P), 4-point probes resistance system (Model No: RTS-9).
4：9). Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The films were deposited by chemical bath deposition followed by hydrothermal crystallization. The optical and electrical properties were then characterized.
5：Data Analysis Methods:
The optical bandgap was estimated using Tauc’s relation, and the refractive index and extinction coefficient were calculated from the optical spectra.
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