研究目的
To investigate the influence of thermal oxidation temperature on the microstructure and photoelectrochemical properties of ZnO nanostructures fabricated from zinc scraps.
研究成果
ZnO nanowires were successfully grown on zinc scrap via thermal oxidation, with temperature significantly affecting morphology and properties. The sample oxidized at 600°C exhibited the highest photocurrent density (252.2 mA/cm2) and carrier density, making it suitable for PEC applications. Thermal oxidation is an efficient, low-cost method for ZnO nanowire fabrication.
研究不足
Thermal oxidation time may not be sufficient to fully oxidize Zn scrap substrates into ZnO structure, as metallic Zn peaks were still present in XRD. Higher temperatures led to loss of nanowire morphology, reducing surface area and PEC efficiency.
1:Experimental Design and Method Selection:
ZnO nanowires were synthesized by thermal oxidation of zinc scrap substrates in air at temperatures from 400°C to 900°C for 2 hours. Characterizations included XRD, SEM, EDX, UV-Vis spectrophotometry, and PEC measurements.
2:Sample Selection and Data Sources:
Zinc scrap substrates obtained from drilling zinc ingot were used. Samples were cleaned with acetone, ethanol, and distilled water ultrasonically before oxidation.
3:List of Experimental Equipment and Materials:
Tube furnace (Protherm), X-ray diffractometer (Bruker AXS D2 Phaser), scanning electron microscope (Jeol JSM-5910LV), energy dispersive spectroscopy, UV-Vis spectrophotometer (PG Instruments T92+), potentiostat (Reference 600 Potentiostat/Gamry), solar light source (100 mW/cm2, Abet Technologies), platinum wire counter electrode, standard calomel reference electrode, 0.1 M Na2SO4 aqueous solution.
4:1 M Na2SO4 aqueous solution.
Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Thermal oxidation in tube furnace, followed by XRD, SEM, EDX for structural and morphological analysis. Optical measurements with UV-Vis. PEC measurements in three-electrode cell with potential scanning and EIS under dark and illuminated conditions.
5:Data Analysis Methods:
XRD data analyzed with Maud software for Rietveld refinement; Scherrer equation for crystalline size; Kubelka-Munk function and Tauc plot for band gap; Mott-Schottky analysis for carrier density; EIS data fitted with equivalent circuit model.
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