1：Experimental Design and Method Selection:

The study used atomic layer deposition (ALD) with Co(BTSA)2(THF) as the metal precursor and H2O as the coreactant. The design aimed to deposit cobalt(II) oxide films at low temperatures, with investigations into saturation behavior, film characterization, and in situ reaction mechanisms.

2：Sample Selection and Data Sources:

Substrates included native oxide terminated Si(100) and soda lime glass (SLG) cut to 5 × 5 cm2 squares. Silicon substrates were used as received; glass substrates were cleaned ultrasonically. Films were deposited in a temperature range of 75–250 °C.

3：List of Experimental Equipment and Materials:

Equipment included a commercial F-120 ALD reactor, thermogravimetric analyzer (TGA), ellipsometer, x-ray diffractometer, XPS spectrometer, AFM, ToF-ERDA setup, QCM, and QMS. Materials included Co(BTSA)2(THF), H2O, D2O, nitrogen gas, and various chemicals for synthesis.

4：Experimental Procedures and Operational Workflow:

Precursor synthesis was done under inert conditions. Film deposition involved alternating pulses of Co(BTSA)2(THF) and H2O with purging steps. In situ studies used QCM and QMS to monitor mass changes and gaseous by-products. Characterization included thickness measurements, structural analysis with GI-XRD, chemical analysis with XPS and ToF-ERDA, and morphological study with AFM.

5：Data Analysis Methods:

Data were analyzed using software packages like CASAXPS for XPS, and numerical integration for QMS and QCM data. Statistical methods included linear fitting for growth per cycle calculations.