研究目的
To investigate the mechanisms underlying the micro-structural modification occurring in the exchanged region of the ion-exchanged glasses during deposition of MgF2 films and bombardment by low energy argon ions.
研究成果
The deposition of MgF2 films and argon ion bombardment induce subsurface modifications in ion-exchanged glasses, including changes in potassium ion distribution, Raman spectral bands, and reduction in compressive stress and depth of layer. These findings indicate structural changes such as increased network polymerization and outward diffusion of potassium ions, providing insights for applications in optoelectronic devices.
研究不足
The study is limited to specific conditions (e.g., 100 eV argon ions, 220°C temperature, MgF2 films) and may not generalize to other materials or energies. The microcolumnar structure of MgF2 films might influence diffusion differently than other film types. Further research is needed on factors controlling preferred orientation and other bombardment parameters.
1：Experimental Design and Method Selection:
The study involved depositing MgF2 films on ion-exchanged glass substrates using ion-assisted electron beam evaporation and bombarding other samples with low-energy argon ions. The rationale was to induce subsurface modifications and analyze changes in microstructure and properties. Theoretical models included diffusion kinetics and structural analysis using various spectroscopic and microscopic techniques.
2：Sample Selection and Data Sources:
Commercial soda lime silicate float glass from Asahi Glass Co., Ltd. was used, ion-exchanged in a KNO3 salt bath at 450°C for 12 hours. Samples were cleaned ultrasonically in acetone and alcohol.
3：List of Experimental Equipment and Materials:
Equipment included ZZS-800 vacuum deposition system with End-Hall ion source (KRI EH-1000), INFICON IC/5 thin film deposition controller, Rikagu Smart Lab 3 diffractometer for GIXRD, JSM-7600F FE-SEM, JXA-8230 EPMA, Labram HR800 micro-Raman spectroscopy, and FSM-6000LE surface stress meter. Materials included high-purity MgF2 target (99.99%), argon gas, and organic solvents.
4：99%), argon gas, and organic solvents. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: For deposition, glass substrates were preheated to 220°C, pre-sputtered for cleaning, and MgF2 films were deposited at a rate of 0.6 nm/s to 400 nm thickness. For bombardment, samples were bombarded with 100 eV argon ions for 20 min at 220°C. Characterization involved GIXRD with 5° incidence angle, FE-SEM for morphology, EPMA for element concentration profiles, Raman spectroscopy on fracture surfaces, and stress measurements.
5：6 nm/s to 400 nm thickness. For bombardment, samples were bombarded with 100 eV argon ions for 20 min at 220°C. Characterization involved GIXRD with 5° incidence angle, FE-SEM for morphology, EPMA for element concentration profiles, Raman spectroscopy on fracture surfaces, and stress measurements. Data Analysis Methods:
5. Data Analysis Methods: Data were analyzed using Labspec and Origin software for Raman spectra fitting with Gaussian peaks. EPMA data were processed for quantitative line scans. Stress and DOL values were averaged from multiple measurements.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
Rikagu Smart Lab 3 diffractometer
Smart Lab 3
Rikagu
Used for grazing incident X-ray diffraction (GIXRD) to characterize crystal structures.
-
FE-SEM
JSM-7600F
JEOL
Field emission scanning electron microscopy for morphological characterization and film thickness analysis.
-
Electron probe micro analyzer
JXA-8230
JEOL
Used for electron probe micro analysis (EPMA) to determine element concentration profiles.
-
ZZS-800 vacuum deposition system
ZZS-800
Used for depositing MgF2 films on glass substrates via ion-assisted electron beam evaporation.
-
End-Hall ion source
EH-1000
KRI
Provides ion assistance during deposition and for bombarding samples with argon ions.
-
INFICON IC/5 thin film deposition controller
IC/5
INFICON
Monitors deposition rate and thickness of thin films.
-
Micro-Raman spectroscopy
Labram HR800
Confocal micro-Raman spectroscopy for studying vibrational spectra of glass samples.
-
Surface stress meter
FSM-6000LE
ORIHARA
Measures compressive stress and depth of layer in glass samples based on photoelastic birefringence.
-
MgF2 target
High-purity target for electron beam evaporation to deposit MgF2 films.
-
登录查看剩余7件设备及参数对照表
查看全部
