研究目的
To develop efficient and stable wide band gap photocathodes for solar hydrogen production using molybdenum disulfide catalytic coatings via atomic layer deposition on copper gallium diselenide absorbers.
研究成果
The study successfully developed a low-temperature ALD-based scheme for MoS2/TiO2 overlayers on CdS/CGSe photocathodes, achieving efficient hydrogen production with an onset potential of +0.53 V vs RHE and stable operation for over 5 hours. However, degradation occurs inhomogeneously, exposing the absorber after prolonged testing. Future work should focus on optimizing the overlayer synthesis for improved durability and extending it to other material systems for tandem water splitting devices.
研究不足
The MoS2/TiO2 overlayers provide only short-term protection (stable for >5 h but degrade after 24 h) in acidic electrolyte, with inhomogeneous degradation leading to exposure of the underlying CGSe absorber. The process involves toxic materials (e.g., CdS, H2S), requiring careful handling. The low-temperature scheme may have constraints in optimizing catalytic activity and durability fully.
1:Experimental Design and Method Selection:
The study employs atomic layer deposition (ALD) to synthesize MoS2 and TiO2 overlayers on CdS/CGSe photocathodes, aiming for low-temperature processing (<200°C) to protect and catalyze the electrodes for hydrogen evolution reaction (HER) in acidic conditions. Methods include coevaporation for CGSe, chemical bath deposition for CdS, ALD for TiO2 and MoOx (converted to MoS2), and tube furnace annealing.
2:Sample Selection and Data Sources:
Samples are fabricated on fluorine-doped tin oxide (FTO) substrates. CGSe films are deposited via a three-stage coevaporation process, with thickness monitored by electron impact emission spectrometry. CdS is deposited by chemical bath deposition. Spectroscopic and electrochemical data are collected from these samples.
3:List of Experimental Equipment and Materials:
Equipment includes ALD reactors (Cambridge Nanotech Savannah and Fiji), tube furnace, spectroscopic ellipsometer, XPS/XAES setup (VG ESCALab MkII with SPECS components), SEM (FEI Magellan 400 XHR), UV-vis-NIR spectrophotometer (Varian Cary 6000i), X-ray diffractometer (Philips PANalytical X'Pert Pro), potentiostat (Bio-Logic VSP), and monochromator (Newport Oriel 74100). Materials include FTO substrates, precursors for ALD (TDMA-Ti, Mo(CO)6, H2S/H2 gas), cadmium sulfate, thiourea, ammonium hydroxide, and various chemicals for deposition and testing.
4:0). Materials include FTO substrates, precursors for ALD (TDMA-Ti, Mo(CO)6, H2S/H2 gas), cadmium sulfate, thiourea, ammonium hydroxide, and various chemicals for deposition and testing. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Steps involve cleaning FTO substrates, depositing CGSe by coevaporation, depositing CdS by chemical bath deposition, depositing TiO2 and MoOx by ALD, converting MoOx to MoS2 in H2S/H2 atmosphere, performing spectroscopic characterizations (XPS, XAES, XES, SEM, etc.), and conducting photoelectrochemical tests (LSV, CA, IPCE) in a three-electrode cell with H2-sparged 0.5 M H2SO4 electrolyte.
5:5 M H2SO4 electrolyte. Data Analysis Methods:
5. Data Analysis Methods: Data analysis includes linear extrapolation for onset potential determination, spectroscopic peak fitting for chemical environment identification, and use of software like ImageJ for area measurement. Statistical methods are not explicitly detailed, but standard calibration and comparison techniques are employed.
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SEM
Magellan 400 XHR
FEI
Taking scanning electron microscopy images.
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X-ray Diffractometer
X'Pert Pro
Philips PANalytical
Performing X-ray diffraction measurements.
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Spectrometer
Jaz EL 200-XR1
Ocean Optics
Measuring irradiance and spectral output.
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ALD Reactor
Savannah
Cambridge Nanotech
Depositing thin films of TiO2 and MoOx via atomic layer deposition.
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ALD Reactor
Fiji
Cambridge Nanotech
Depositing thin films of MoOx via atomic layer deposition.
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Spectroscopic Ellipsometer
Measuring thickness of TiO2 and MoOx layers.
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XPS System
VG ESCALab MkII
VG
Performing X-ray photoelectron spectroscopy and X-ray excited Auger electron spectroscopy.
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Electron Analyzer
PHOIBOS 150 MCD
SPECS
Analyzing electrons in XPS and XAES.
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X-ray Source
XR-50
SPECS
Generating X-rays for spectroscopy.
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UV-vis-NIR Spectrophotometer
Cary 6000i
Varian
Performing optical transmission measurements.
Cary 60 UV-Vis Spectrophotometer
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Potentiostat
VSP
Bio-Logic
Conducting photoelectrochemical measurements.
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Monochromator
74100
Newport Oriel
Used in IPCE measurements with a Hg/Xe arc lamp.
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Stylus Profilometer
Alpha step 200
Tencor
Measuring film thickness.
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Electron Impact Emission Spectrometer
Guardian EIES controller
Inficon
Monitoring thickness during deposition.
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Gas Detector
GX-2009
RKI Instruments
Testing for H2S leaks.
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