研究目的
To study the effect of optical illumination on resistive switching in ZrO2(Y) films with embedded Au nanoparticles using tunneling atomic force microscopy, focusing on the role of plasmon resonance.
研究成果
Optical illumination at the plasmon-resonance wavelength enhances resistive switching in ZrO2(Y) films with Au nanoparticles, primarily due to photon-assisted field emission of electrons from Au nanoparticles to the ZrO2(Y) conduction band. This leads to local heating and stimulation of conductive filament growth, with potential applications in optically controllable memristive devices.
研究不足
The study is limited to specific sample conditions (e.g., film thickness, nanoparticle size) and may not generalize to other materials or configurations. The optical illumination effect is only significant under plasmon-resonance conditions, and the experimental setup requires ultrahigh vacuum, which could restrict practical applications.
1:Experimental Design and Method Selection:
The study uses tunneling atomic force microscopy (AFM) to investigate resistive switching in ZrO2(Y) films with Au nanoparticles. The method involves cyclic current-voltage characteristic (CVC) measurements under optical illumination at the plasmon-resonance wavelength.
2:Sample Selection and Data Sources:
Samples are ultrathin ZrO2(Y) films (~4 nm thick) with embedded single-layer Au nanoparticle arrays (2–3 nm in size) grown on glass substrates with a conductive indium-tin-oxide (ITO) sublayer. Reference samples without nanoparticles are also used.
3:List of Experimental Equipment and Materials:
Equipment includes a Torr International MSS-3GS vacuum thin-film deposition system for sample preparation, a Varian Cary 6000i spectrophotometer for optical absorption spectroscopy, an Omicron UHV AFM/STM LF1 setup with NT MDT NSG-11 DCP AFM probes for AFM measurements, and a semiconductor laser for optical excitation. Materials include ZrO2–Y2O3 target, Au, glass substrates with ITO, and neutral light filters.
4:Experimental Procedures and Operational Workflow:
Samples are prepared via layerwise magnetron sputtering and annealing. AFM scanning is done in contact mode, with CVCs measured by sweeping voltage from -6 V to +6 V. Optical illumination is applied through the substrate using a laser at 660 nm wavelength, with intensity regulated by filters.
5:Data Analysis Methods:
Data analysis involves comparing CVCs with and without illumination, estimating temperature increases using thermal conductivity equations, and analyzing field emission using the Fowler-Nordheim mechanism.
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vacuum thin-film deposition system
MSS-3GS
Torr International
Used for layerwise magnetron sputtering to grow ZrO2(Y) films and Au layers on substrates.
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spectrophotometer
Cary 6000i
Varian
Used for optical absorption spectroscopy to examine the optical properties of nanocomposite films.
Cary 60 UV-Vis Spectrophotometer
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AFM setup
UHV AFM/STM LF1
Omicron
Part of the Omicron MultiProbe RM system, used for tunneling atomic force microscopy to study resistive switching in ultrahigh vacuum.
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AFM probe
NSG-11 DCP
NT MDT
Used for scanning in contact mode and measuring current-voltage characteristics, with a diamond-like conductive coating.
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semiconductor laser
Used for optical excitation through the transparent substrate at the plasmon-resonance wavelength.
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neutral light filters
Used to regulate the intensity of the laser photoexcitation.
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