研究目的
Investigating the correlation between the acetylene plasma discharge environment, specifically the intensity of C4H2+ ion emissions, and the optical and electronic properties of hydrogenated amorphous carbon (a-C:H) films.
研究成果
The research successfully demonstrates a correlation between the acetylene plasma discharge environment, particularly the intensity ratio of C4H2+ to CH emissions, and the properties of a-C:H films. At low power (≤100 W), films are polymeric with high sp3 and hydrogen content. Increasing power enhances the C4H2+/CH ratio, promoting dehydrogenation and transformation to graphitic a-C:H with lower sp3 and hydrogen content. The PSR effect is identified as a key factor in enhancing electron temperature and ionization, facilitating film property control. This correlation provides a basis for optimizing a-C:H film deposition for applications in optoelectronics and coatings.
研究不足
The study uses a homemade RF CCP system, which may have limitations in reproducibility and scalability compared to commercial systems. The PSR effect's role in enhancing electron temperature and ionization is inferred but not directly quantified. EDS measurements, while controlled for accelerating voltage, may still be influenced by film thickness variations. The correlation between OES intensities and film properties is established but requires further validation under varied conditions. The use of only one excitation wavelength (532 nm) for Raman spectroscopy limits the dispersion analysis for sp3 content.
1:Experimental Design and Method Selection:
A homemade asymmetric RF CCP source operating at
2:56 MHz was used to deposit a-C:
H films from pure C2H2 plasma. The films were deposited at different powers (100-600 W) and a gas pressure of 40 mTorr. The study aimed to correlate plasma electrical and optical measurements with film properties, utilizing the plasma series resonance (PSR) effect to enhance ionization and control film transformation from polymeric to graphitic a-C:H.
3:Sample Selection and Data Sources:
Glass substrates were used for film deposition. Plasma species were characterized using optical emission spectroscopy (OES), and films were analyzed using SEM, EDS, Raman spectroscopy, FTIR, and UV-Vis spectrophotometry.
4:List of Experimental Equipment and Materials:
RF CCP source (homemade, 13.56 MHz, 1 kW), matching network (π type with variable air gap capacitors and air variable coil), derivative probe for current measurement, Ocean Optics USB4000 Spectrometer for OES, SEM (Quanta EFI 250, Philips, Netherlands) with EDS, Raman spectrometer (Bruker Senterra, 532 nm laser), FTIR spectrometer (VERTEX 70/70V, Bruker Optics, Germany), UV-Vis spectrophotometer (Jasco V-630, Japan). Materials included acetylene gas, glass substrates, and cooling water.
5:56 MHz, 1 kW), matching network (π type with variable air gap capacitors and air variable coil), derivative probe for current measurement, Ocean Optics USB4000 Spectrometer for OES, SEM (Quanta EFI 250, Philips, Netherlands) with EDS, Raman spectrometer (Bruker Senterra, 532 nm laser), FTIR spectrometer (VERTEX 70/70V, Bruker Optics, Germany), UV-Vis spectrophotometer (Jasco V-630, Japan). Materials included acetylene gas, glass substrates, and cooling water. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: The chamber was evacuated, and C2H2 gas was injected. Films were deposited at varying powers (100-600 W) and 40 mTorr pressure. OES was performed near the substrate surface. Current waveforms were measured, and FFT was applied to study PSR effects. Films were characterized post-deposition using SEM, EDS, Raman, FTIR, and UV-Vis absorption.
6:Data Analysis Methods:
OES data analyzed intensities of species like C4H2+, CH, C2, and Hα. Raman spectra were fitted with Breit-Wigner-Fano (BWF) and Lorentzian functions to extract G peak position, ID/IG ratio, and sp3 content. FTIR spectra were analyzed for CH and C=C vibrations. EDS data quantified carbon content. Optical band gaps were estimated from absorption spectra.
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Spectrometer
USB4000
Ocean Optics
Collection of optical emission spectra
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Raman Spectrometer
Senterra
Bruker
Raman spectroscopy for structural analysis
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FTIR Spectrometer
VERTEX 70/70V
Bruker Optics
Infrared spectroscopy for bonding analysis
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UV-Vis Spectrophotometer
V-630
Jasco
Recording absorption spectra for optical band gap estimation
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RF CCP source
Homemade, 13.56 MHz, 1 kW
Homemade
Generation of plasma discharge for film deposition
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Matching network
π type with variable air gap capacitors 0-250 pF and air variable coil
Not specified
Impedance matching to minimize reflected power
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Derivative probe
Not specified
Not specified
Measurement of discharge current
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SEM
Quanta EFI 250
Philips
Investigation of deposited films morphology
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EDS system
Attached to SEM
Not specified
Energy dispersive X-ray measurements for elemental analysis
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