1：Experimental Design and Method Selection:

The study employs epitaxial liftoff (ELO) using a ZnO sacrificial layer to fabricate flexible VO2 nanomembranes. The method involves RF magnetron sputtering for film deposition, wet etching with HCl to release the membrane, and transfer onto flexible substrates like PET. The rationale is to overcome limitations of traditional strain engineering methods by enabling large-scale, damage-free transfer of VO2 films.

2：Sample Selection and Data Sources:

VO2 films (80 nm) and ZnO sacrificial layers (100 nm) are epitaxially grown on Al2O3(0001) substrates. Samples are characterized before and after transfer to assess structural and electrical properties.

3：List of Experimental Equipment and Materials:

Equipment includes RF magnetron sputtering system, spin coater, HCl solution, methylbenzene, black wax, PET substrates, thermal evaporator for Au contacts, XRD diffractometer, AFM, TEM, XPS spectrometer, Keithley-4200 semiconductor characterization system, Lakeshore temperature controller, and a home-designed bending stage. Materials include ZnO and V2O5 sputtering targets, Al2O3 wafers, Au for electrodes.

4：Experimental Procedures and Operational Workflow:

Steps include: a) Epitaxial growth of ZnO and VO2 on Al2O3 via RF sputtering. b) Spin coating black wax as a supporting layer. c) Etching ZnO with HCl to release VO2 membrane. d) Transferring membrane to PET substrate. e) Removing wax with methylbenzene. f) Fabricating tactile sensors with Au electrodes. g) Characterizing structure (XRD, TEM, XPS), electrical properties (I-V curves, resistance vs. temperature, strain response), and performance (bending tests, pulse monitoring).

5：Data Analysis Methods:

Data analysis involves deriving gauge factors from strain-resistance relationships, statistical analysis of pulse waveform parameters (ΔtDVP, AIr, k), and using Gaussian fits for transition characteristics. Software tools are not specified, but measurements are performed with dedicated instruments like Keithley-4200.