研究目的
Investigating the deterministic integration of quantum dots into on-chip multi-mode interference couplers using in-situ electron beam lithography for scalable on-chip quantum circuits.
研究成果
The deterministic integration of quantum dots into on-chip beam splitters using in-situ electron beam lithography has been successfully demonstrated, enabling the realization of complex on-chip quantum circuits with high process yield. This method supports the development of scalable on-chip quantum circuits and photonic quantum computers.
研究不足
The study focuses on the integration of single quantum dots and the realization of 50/50 coupling elements, with ongoing work towards heterogeneous integrated quantum photonic devices and multi-QD quantum circuits.
1:Experimental Design and Method Selection:
The study employs in-situ electron beam lithography (EBL) for patterning photonic building blocks on top of pre-characterized quantum dots (QDs).
2:Sample Selection and Data Sources:
QDs are spatially and spectrally pre-characterized using cathodoluminescence mapping at cryogenic temperatures (~10 K).
3:List of Experimental Equipment and Materials:
The technology platform includes EBL for patterning and cryogenic cathodoluminescence mapping for QD characterization.
4:Experimental Procedures and Operational Workflow:
The process involves selecting a suitable QD, low-temperature EBL of an on-chip waveguide circuit aligned with nm accuracy to the pre-selected QD, resist development, and plasma etching.
5:Data Analysis Methods:
The functionality of the QD-waveguide structures is demonstrated by high-resolution μPL spectroscopy and studying photon cross-correlation between output ports.
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