研究目的
To develop a characterization tool for measuring the sheet resistance at 9 places on a diffused silicon wafer using 9 four probe heads mounted on a single plate, enabling the determination of uniformity of diffusion in a diffused silicon wafer within few seconds.
研究成果
The developed characterization tool enables rapid measurement of sheet resistance at 9 places on a large area diffused silicon wafer, facilitating tighter control over the diffusion process and enhancing solar cell efficiency. The tool is production-worthy and can significantly improve the uniformity of sheet resistance, leading to higher efficiency solar cells.
研究不足
The tool is specifically designed for large area silicon wafers and may not be suitable for smaller or differently shaped samples without modification.
1：Experimental Design and Method Selection:
The setup includes a gantry of 9 four probe heads arranged in a 3 by 3 matrix, moving up and down using a stepper motor. The electronic circuitry is designed to take readings from each head sequentially, displaying results on a computer monitor.
2：Sample Selection and Data Sources:
Diffused silicon wafers of size 156 mm by 156 mm are used.
3：List of Experimental Equipment and Materials:
The Sheet Resistance Measurement Setup (SRMS) includes 9 four probe heads, a stepper motor, electronic circuitry, and a computer for data display.
4：Experimental Procedures and Operational Workflow:
The wafer is placed on a polymer jig, the system is turned on, and the 'Run test' tab is clicked to initiate the measurement process. The probe head gantry moves down to contact the wafer, takes readings, and displays results.
5：Data Analysis Methods:
The software displays results in graphical and tabular form, including mean, minimum, and maximum values, and determines pass/fail based on set criteria.
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