研究目的
Investigating the principle of selecting reactive components that inhibit aggregation and preserve photoluminescent properties in quantum dot (QD) photoresists.
研究成果
The study successfully demonstrated the design of low-cost, high-performance QD photoresists with excellent pattern uniformity and suppressed aggregation by selecting appropriate reactive components. The use of BMEP/DDT-capped QDs and bisphenol A ethoxylate dimethacrylate as a reactive cross-partner was key to achieving these results.
研究不足
The study acknowledges the limitation of PL quenching due to surface defects and the need for further verification of the role of DDT in minimizing QY loss during ligand exchange.
1:Experimental Design and Method Selection:
The study involved ligand exchange processes, surface analysis by spectroscopic techniques, particle size distribution by dynamic light scattering (DLS), and analysis of optical properties to investigate compatibility between reactive components and functionalized QDs.
2:Sample Selection and Data Sources:
Oleic acid capped CdSe@ZnS quantum dot dispersion was used as the model QD. Various reactive components (CPs) were tested for their compatibility with surface-modified QDs.
3:List of Experimental Equipment and Materials:
Equipment included Shimadzu UV-1800 spectrophotometer, AxioCam HRc, ZEISS for fluorescent images, Quantaurus-QY Absolute PL quantum yield spectrometer, PerkinElmer for FT-IR, ELSZ-2000 for particle size analysis, TG/DTA6100 for TGA, DektakXT for film thickness measurement, and Karl Suss MJB3 UV400 mask aligner for micro-patterning. Materials included various reactive monomers and solvents.
4:Experimental Procedures and Operational Workflow:
The process involved ligand exchange, preparation of QD dispersions, formulation of photoresists, and photolithography patterning.
5:Data Analysis Methods:
Optical properties were analyzed using UV-vis and PL spectroscopy, particle size distribution by DLS, and pattern uniformity by SEM and fluorescence microscopy.
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Quantaurus-QY Absolute PL quantum yield spectrometer
C11347-12
Hamamatsu
Time-resolved PL decay curve and PL properties measurement
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DektakXT
DektakXT
BRUKER
Film thickness measurement
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Shimadzu UV-1800 spectrophotometer
UV-1800
Shimadzu
UV-vis tests
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AxioCam HRc
HRc
ZEISS
Fluorescent images
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PerkinElmer
PerkinElmer
FT-IR
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ELSZ-2000
ELSZ-2000
Otsuka electronics
Particle size analyzer
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TG/DTA6100
TG/DTA6100
Seiko Exstar 6000
TGA
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Karl Suss MJB3 UV400 mask aligner
MJB3 UV400
Karl Suss
Micro-patterning
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