研究目的
Organizing Cu nano-particles of controlled size in ordered arrays at room temperature using size-selected nanoclusters and ion induced ripple patterns as substrate.
研究成果
Organization of size selected clusters at room temperature has been achieved using ion induced nanorippled templates. The quality of ordering of clusters over the patterned silicon substrate is found to depend on the quality of ordering in the ripple itself. The size and number density of the nanoparticles in the array can be independently varied, which can be exploited to investigate the nearest neighbour interaction in the array of size-selected metal particles useful for many future possibilities.
研究不足
The quality of ordering of the obtained nanoparticle-arrays depends on the pattern parameters at a particular deposition angle. The study found that at 15° deposition angle, better ordering was obtained, but the quality of ordering was not uniformly high across all areas of the substrate due to pattern non-uniformity in nanoscale and larger scale area.
1：Experimental Design and Method Selection:
The study involves the guided deposition of size-selected nanoparticles via periodic modulation of the substrate surface. Ultra-high vacuum compatible magnetron-based gas-aggregation type source combined with a quadrupole mass filter was used to produce the size-selected nanoclusters. Surface modulations (ripples) in the nanoscale were induced by low energy oblique angle ion beam irradiation.
2：Sample Selection and Data Sources:
Si (100) surface was used as the substrate. The ion beam irradiation was performed using Ar ions of energy 500 eV at an incident angle of 25° with respect to the surface plane.
3：List of Experimental Equipment and Materials:
Magnetron-based gas-aggregation type source, quadrupole mass filter, high-resolution scanning electron microscopy (HRSEM), atomic force microscopy (AFM), x-ray photoelectron spectroscopy (XPS).
4：Experimental Procedures and Operational Workflow:
The deposition was carried out at three different angles of deposition (45°, 15°, and 5°) with respect to the substrate plane. The morphological aspects of the deposited nanoclusters and the substrates were characterized by HRSEM and AFM. The chemical composition was characterized by XPS.
5：Data Analysis Methods:
The alignment of size-selected metal nanoclusters along the substrate-patterns was observed and analyzed based on the deposition conditions.
独家科研数据包，助您复现前沿成果，加速创新突破
获取完整内容-
high-resolution scanning electron microscope
Supra40
ZEISS
Characterization of morphological aspects of deposited nanoclusters and the substrates
立即获取同款设备 -
Scanning Probe Microscope
NanoscopeIV
Veeco
Characterization of morphological aspects of deposited nanoclusters and the substrates in ambient condition
暂无现货
预约到货通知
-
twin anode x-ray source
Compositional analysis of the deposited nanoclusters by x-ray photoelectron spectroscopy
暂无现货
预约到货通知
-
hemispherical electron analyzer
150 mm bolt-on
Compositional analysis of the deposited nanoclusters by x-ray photoelectron spectroscopy
暂无现货
预约到货通知
-
magnetron-based gas-aggregation type source
Production of size-selected nanoclusters
暂无现货
预约到货通知
-
quadrupole mass filter
Production of size-selected nanoclusters
暂无现货
预约到货通知
-
登录查看剩余4件设备及参数对照表
查看全部
