研究目的
Investigating the growth of large-area, high-quality epitaxial graphene on 4H-SiC(0001) using a high-power continuous laser for applications in conductive films.
研究成果
The laser irradiation technique is a practical tool to designate wafer-scale graphene on semi-insulating 4H-SiC substrates for modern electronic platforms. Few-layer EG was synthesized by laser irradiation within the min timescale and over a large area (~10 × 5 mm2) with high quality (D/G area ratio: ~0.03). The obtained graphene/SiC samples are highly conductive with a sheet resistance of as low as ~0.54 Ω/sq, making them very promising for applications as conductive films.
研究不足
The study is limited by the specific conditions of laser irradiation and the properties of the 4H-SiC substrate. The scalability of the method and the uniformity of graphene growth over larger areas need further investigation.
1:Experimental Design and Method Selection:
The study utilized a high-power solid-state super-Gaussian continuous laser beam (Nd: YAG, wavelength = 1 μm) to irradiate the entire substrate through a quartz glass window with a spot size of 25 × 25 mm2. The deposition temperature was measured using an infrared pyrometer. The laser was operated in an open-loop mode, allowing the temperature to rise to a specific temperature at a certain laser power setting for immediate response, resulting in a heating rate of 500 K/s.
2:The deposition temperature was measured using an infrared pyrometer. The laser was operated in an open-loop mode, allowing the temperature to rise to a specific temperature at a certain laser power setting for immediate response, resulting in a heating rate of 500 K/s. Sample Selection and Data Sources:
2. Sample Selection and Data Sources: Graphene was grown on a 330 μm-thick 4H-SiC(0001) substrate (~10 × 5 mm2) with a Si-terminated polished face. Before placing the substrates into the chamber, they were cleaned following the Radio Corporation of America cleaning procedure.
3:List of Experimental Equipment and Materials:
High-power solid-state super-Gaussian continuous laser (Nd: YAG, wavelength = 1 μm), infrared pyrometer (Optris GmbH., Berlin, Germany), Raman spectroscopy (LabRAM HR Evolution; Horiba, Paris, France), atomic force microscopy (AFM, ICON2-SYS, Bruker, USA), cross-section TEM (JEOL JEM-2100 TITAN, Talos F200S, and Titan Cubed Themis G2 300), X-ray photoelectron spectroscopy (XPS, Multilab 2000, VG Inc.), ultraviolet photoelectron spectroscopy (UPS, Thermo ESCALAB 250XI), van der Pauw four-point probe Hall measurement system (HL5500 PC).
4:Experimental Procedures and Operational Workflow:
The SiC substrate was placed on a stage in a vacuum chamber with an Ar-gas flow and a pressure of 90 mbar. The laser was used to irradiate the entire substrate, and the sample was heated between 1550 °C and 1780 °C for 5 min. The number of layers and the quality of the obtained graphene were examined by Raman spectroscopy. The morphology was determined by AFM. Cross-section TEM images were used to determine the number of layers and stacking sequence of graphene. XPS and UPS were used to measure the binding energies and electronic structure, and the electrical properties were measured using a van der Pauw four-point probe Hall measurement system.
5:Data Analysis Methods:
The Raman spectra were analyzed to determine the quality and number of graphene layers. AFM and TEM images were analyzed to determine the morphology and stacking sequence of graphene. XPS and UPS data were analyzed to measure the binding energies and electronic structure. The electrical properties were analyzed using the van der Pauw four-point probe Hall measurement system.
独家科研数据包,助您复现前沿成果,加速创新突破
获取完整内容-
Atomic force microscopy
ICON2-SYS
Bruker
Used to determine the morphology of graphene.
-
Transmission electron microscopy
JEOL JEM-2100 TITAN, Talos F200S, Titan Cubed Themis G2 300
JEOL
Used to determine the number of layers and stacking sequence of graphene.
-
Ultraviolet photoelectron spectroscopy
Thermo ESCALAB 250XI
Thermo
Used to estimate the work function.
-
Nd: YAG laser
Beijing ZK Laser Co., Ltd.
Used to irradiate the entire substrate for graphene growth.
-
Infrared pyrometer
Optris GmbH.
Used to measure the deposition temperature.
-
Raman spectroscopy
LabRAM HR Evolution
Horiba
Used to examine the number of layers and the quality of the obtained graphene.
-
X-ray photoelectron spectroscopy
Multilab 2000
VG Inc.
Used to measure the binding energies and electronic structure.
-
van der Pauw four-point probe Hall measurement system
HL5500 PC
Used to measure the electrical properties.
-
登录查看剩余6件设备及参数对照表
查看全部