研究目的
To obtain highly stable all-inorganic CsPbBr3 nanocrystals film by encapsulating it with alumina using plasma-enhanced atomic layer deposition to address the material instability issues.
研究成果
The PEALD method successfully deposited dense Al2O3 films on CsPbBr3 NCs, significantly enhancing their stability against moisture, oxygen, water, and UV light. This approach is more efficient than TALD, requiring fewer deposition cycles, and opens avenues for practical optoelectronic applications by addressing the key instability issue.
研究不足
The study is limited to CsPbBr3 NCs and Al2O3 encapsulation; other materials or methods were not explored. The low deposition temperature (50°C) was necessary to avoid damaging NCs, but it might restrict the quality of TALD films. The encapsulation effectiveness may vary with different NCs sizes or film thicknesses not fully investigated.
1:Experimental Design and Method Selection:
The study employed plasma-enhanced atomic layer deposition (PEALD) to deposit Al2O3 on CsPbBr3 NCs films for encapsulation, comparing it with thermal atomic layer deposition (TALD). The rationale was to use PEALD for denser and more efficient film growth at low temperatures to protect the NCs from environmental degradation.
2:Sample Selection and Data Sources:
CsPbBr3 NCs were synthesized using lead bromide, cesium carbonate, 1-octadecene, oleic acid, and oleylamine. Films were spin-coated on glass substrates. Samples included pristine NCs films and those coated with Al2O3 via PEALD or TALD.
3:List of Experimental Equipment and Materials:
Equipment included a PEALD system (Jiaxing Ke-micro Technology), TEM (JEM-2100), SEM (JSM 6701F), UV-VIS-NIR spectrometer (Lambda 750S), spectrofluorometer (Edinburgh instruments FS5), XPS (ESCALAB 250Xi), and spectroscopic ellipsometry. Materials included PbBr2 (99.999%, YingKou YouXuan Trade Co. Ltd.), Cs2CO3 (99.999%, Macklin), ODE (90%, Macklin), OA (90%), OAm (90%, ShangHai D&B Biological Science and Technology Co. Ltd.), TMA, and O2 plasma.
4:999%, YingKou YouXuan Trade Co. Ltd.), Cs2CO3 (999%, Macklin), ODE (90%, Macklin), OA (90%), OAm (90%, ShangHai D&B Biological Science and Technology Co. Ltd.), TMA, and O2 plasma. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: NCs synthesis involved degassing and heating reactants, injection, cooling, precipitation, and centrifugation. Films were spin-coated at 2000 rpm for 40s. Al2O3 deposition was done at 50°C with specific cycle parameters for PEALD (TMA and O2 plasma) and TALD (TMA and H2O). Characterization included TEM, SEM, absorption spectra, PLQY measurements, XPS, and stability tests under ambient conditions, water immersion, and UV light.
5:0s. Al2O3 deposition was done at 50°C with specific cycle parameters for PEALD (TMA and O2 plasma) and TALD (TMA and H2O). Characterization included TEM, SEM, absorption spectra, PLQY measurements, XPS, and stability tests under ambient conditions, water immersion, and UV light. Data Analysis Methods:
5. Data Analysis Methods: Data were analyzed using standard techniques for microscopy, spectroscopy, and XPS to assess film morphology, optical properties, and elemental composition. Stability was evaluated by monitoring PLQY over time.
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TEM instrument
JEM-2100
JEOL
Used for taking transmission electron microscopy images of nanocrystals.
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SEM system
JSM 6701F
JEOL
Used for obtaining scanning electron microscopy images of films.
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UV-VIS-NIR spectrometer
Lambda 750S
PerkinElmer
Used for collecting absorption spectra of nanocrystals films.
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Spectrofluorometer
FS5
Edinburgh instruments
Used for measuring photoluminescence quantum yield of films.
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XPS
ESCALAB 250Xi
Thermo Fisher Scientific
Used for X-ray photoelectron spectroscopy analysis of film surfaces.
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PEALD system
Jiaxing Ke-micro Technology
Used for depositing alumina films via plasma-enhanced atomic layer deposition.
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Spectroscopic ellipsometry
Used for measuring film thickness.
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UV lamp
Used for UV light illumination stability tests.
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