研究目的
Investigating the effects of substrate temperature and precursor amount on the optical properties and microstructure of amorphous TiO2 thin films deposited by chemical vapor deposition at low temperature without an oxygen source or annealing.
研究成果
The amorphous TiO2 thin films exhibited controlled optical and microstructural properties dependent on substrate temperature and precursor amount. Key findings include increased surface roughness and isotropy with higher temperature and lower precursor amount, uniform nanoparticle size distribution, and tunable optical parameters such as band gap (3.36-3.43 eV) and refractive index. The films show high transparency and low dissipation factor, making them suitable for optical coatings and devices. Future studies could focus on extending to crystalline phases or other deposition conditions.
研究不足
The study is limited to amorphous TiO2 thin films deposited at low temperatures (100 and 125 °C) without oxygen source or annealing, which may not be applicable to crystalline phases or higher temperature processes. The use of specific precursor amounts and substrate positions may restrict generalizability. Potential optimizations include exploring a wider range of temperatures, precursor types, or annealing treatments to enhance film properties.
1：Experimental Design and Method Selection:
TiO2 thin films were prepared by metal-organic chemical vapor deposition (MO-CVD) using tetra isopropylorthotitanate (TIOT) as a precursor. The deposition was conducted in a horizontal quartz tube furnace at low temperatures (100 and 125 °C) without an oxygen source or annealing.
2：Sample Selection and Data Sources:
Glass substrates (25mm×
3：5mm×1mm) were cleaned with soap solution and sonicated in ethanol and distilled water before deposition. Two different volumes of TIOT precursor were used:
4：75 mL and 00 mL. List of Experimental Equipment and Materials:
Equipment includes a horizontal quartz tube furnace, X-ray diffractometer (STOE-STADV, Cu Kα, λ =
5：54060 ?), atomic force microscope (NANO SURF), UV-visible spectrophotometer (JASCO V-630), and high purity nitrogen as carrier gas. Materials include TIOT precursor (99%, Merck) and glass substrates. Experimental Procedures and Operational Workflow:
The precursor was vaporized at 50 °C and deposited on substrates at positions S1 (100 °C) and S2 (125 °C) for 1 hour using nitrogen carrier gas. Post-deposition, samples were analyzed using XRD, AFM, and UV-Vis spectroscopy.
6：Data Analysis Methods:
Structural analysis via XRD, surface morphology via AFM (including roughness and texture analysis), optical properties via transmittance spectra using Swanepoel's method, and calculations for optical band gap, refractive index, extinction coefficient, dielectric function, Urbach energy, and dispersion parameters.
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