研究目的
To investigate the influence of thermal treatment on the crystallization, surface morphology, cross-section structure, film chemistry, and optical properties of SrTiO3 thin films deposited by RF magnetron sputtering.
研究成果
SrTiO3 thin films transition from amorphous to polycrystalline at annealing temperatures between 500°C and 600°C. Annealing increases grain size and surface roughness while decreasing inhomogeneity and band gap energy. The refractive index increases up to 700°C annealing and then decreases. These findings provide valuable references for applications in integrated optical and electrical devices.
研究不足
The study is limited to SrTiO3 films on silicon substrates and annealing in nitrogen atmosphere; other substrates or annealing environments were not explored. The optical measurements are confined to the spectral range of 280-800 nm. Potential cracks in films at higher annealing temperatures may affect results.
1：Experimental Design and Method Selection:
SrTiO3 thin films were deposited on silicon substrates using RF magnetron sputtering, followed by annealing at different temperatures (500–800 °C) in nitrogen for one hour. Structural and optical characterizations were performed using XRD, HRTEM, XPS, AFM, and spectroscopic ellipsometry.
2：Sample Selection and Data Sources:
Silicon substrates with <100> single crystalline orientation were used. Samples included as-deposited and annealed at 500°C, 600°C, 700°C, and 800°C.
3：List of Experimental Equipment and Materials:
RF magnetron sputtering system (LAB600sp, Leybold Optics GmbH), SrTiO3 target (
4：99% purity, 4 inches diameter, 6 mm thickness), mass flowmeter (MFC, Bronkhorst High-Tech B.V.), XRD (Rigaku D/MAX 2550 VB/PC), AFM (PSIA XE-100), HRTEM (FEI), XPS (Thermo Fisher Scientific), spectroscopic ellipsometry (Self-development). Experimental Procedures and Operational Workflow:
Deposition at room temperature with background pressure
5：0 × 10^{-6} mbar, RF power 75 W, working pressure 6 × 10^{-3} mbar. Annealing in nitrogen for 1 hour. Characterizations:
XRD for crystallinity, AFM for surface roughness, HRTEM for cross-section microstructure, XPS for chemical analysis, ellipsometry for optical constants.
6：Data Analysis Methods:
XRD data analyzed using Scherrer's formula for grain size. Ellipsometry data fitted with Lorentz oscillator model and Maxwell-Garnett EMA. Band gap calculated using Tauc plot method.
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