1：Experimental Design and Method Selection:

The study uses molecular layer deposition (MLD) to deposit hybrid thin films by sequentially introducing TTIP and nucleobase precursors with purging steps. In situ QCM measurements monitor growth dynamics, and various characterization techniques (FTIR, XPS, XRD, ellipsometry, XRR, AFM, contact angle goniometry) are employed to analyze film properties.

2：Sample Selection and Data Sources:

Films are deposited on precleaned single crystal Si(100) substrates. Nucleobase powders (thymine, uracil, adenine) and TTIP are used as precursors.

3：List of Experimental Equipment and Materials:

Equipment includes an F120-Sat reactor for deposition, Maxtek TM400 QCM unit, J.A. Woollam alpha-SE spectroscopic ellipsometer, Bruker AXS D8 advance film diffractometer for XRR, Thermo Scientific Theta Probe XPS system, Bruker VERTEX 80 FTIR spectrometer, Park XE70 AFM device, and ramé-hart contact angle goniometer. Materials include TTIP (Sigma ≥97.0%), thymine (Sigma ≥99%), uracil (Sigma ≥99.0%), adenine (Sigma ≥99%), and nitrogen carrier gas.

4：0%), thymine (Sigma ≥99%), uracil (Sigma ≥0%), adenine (Sigma ≥99%), and nitrogen carrier gas. Experimental Procedures and Operational Workflow:

4. Experimental Procedures and Operational Workflow: Precursors are pulsed sequentially with specific pulse and purge times at temperatures ranging from 225–350°C. Growth is monitored via QCM. Films are characterized for thickness, refractive index, density, chemical bonding, surface topography, and wettability before and after water exposure.

5：Data Analysis Methods:

Data analysis involves fitting ellipsometry data with a Cauchy model, using the Sauerbrey equation for QCM mass conversion, and standard techniques for XPS, FTIR, XRD, and AFM data interpretation.