- 标题
- 摘要
- 关键词
- 实验方案
- 产品
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Control of adhesion force for micro LED transfer using a magnetorheological elastomer
摘要： Liquid crystal display and organic light emitting diode (LED) account for most of the display market. Globally, micro LED has gained wide attention. A microchip must be moved on the substrate correctly to mass-produce micro LED displays. The original method of moving microchips uses a polymer stamp to control adhesion, such as changing contact force and separation velocity. However, this method causes the problem of repeatability. In this study, a stamp is produced based on biomaterial engineering that controls the characteristic of the material surface using microstructures. The magnetorheological elastomer is used, which can control mechanical properties according to the magnetic field. Furthermore, the possibility of the pick and place process for microchips is analyzed.
关键词： Adhesion force,MRE (magnetorheological elastomer),Photolithography,Micro-structure
更新于2025-09-12 10:27:22
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MULTILAYERED SUPERLENSES CONTAINING CSBR OR ACTIVE MEDIUM FOR SUBWAVELENGTH PHOTOLITHOGRAPHY
摘要： The characteristics of periodic multilayered near-field superlenses are analyzed and optimized, using the dispersion relation derived from an effective medium theory and the transfer function in the spectral domain. The k'z-kx contours are used to explain and predict the spectral width, amplitude and phase of the transfer function. Superlenses containing CsBr or active layers are proposed to reduce image distortion or to compensate for the propagation loss, respectively. The parameters of the superlenses can be optimized by simulations to resolve half-pitch features down to λ/36 using CsBr layers, and λ/20 using active layers.
关键词： subwavelength imaging,CsBr,superlens,photolithography,active medium
更新于2025-09-11 14:15:04
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[Methods in Molecular Biology] Microfluidic Electrophoresis Volume 1906 (Methods and Protocols) || Fabrication of Glass Microfluidic Devices
摘要： This chapter provides step-by-step procedures for the fabrication of glass-based micro?uidic devices. These procedures include device design, photomask generation, photolithography, channel etching, and high-temperature bonding.
关键词： Glass bonding,Micro?uidics,Photolithography,Etching,Channel manifold
更新于2025-09-10 09:29:36
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Precise Micropatterning of a Porous Poly(Ionic Liquid) via Maskless Photolithography for High-Performance Non-Enzymatic H2O2 Sensing
摘要： Porous poly(ionic liquid)s (PILs) recently have been actively serving as a multifunctional, interdisciplinary materials platform in quite a few research areas, including separation, catalysis, actuator, sensor, and energy storage, just to name a few. In this context, the capability to photo-pattern PIL microstructures in a porous state on a substrate is still missing but is a crucial step for their real industrial usage. Here, we developed a method for in situ rapid patterning of porous PIL microstructures via a maskless photolithography approach coupled with a simple electrostatic complexation treatment. This breakthrough enables designs of miniaturized sensors. As exemplified in this work, upon loading Pt nanoparticles into porous PIL microstructures, the hybrid sensor showed outstanding performance, bearing both a high sensitivity and a wide detection range.
关键词： nanoparticles,maskless photolithography,poly(ionic liquid),H2O2 sensors,porous microstructures
更新于2025-09-10 09:29:36
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Guided-mode resonant narrowband terahertz filtering by periodic metallic stripe and patch arrays on cyclo-olefin substrates
摘要： We experimentally and theoretically demonstrate a class of narrowband transmissive filters in the terahertz spectrum. Their operation is based on the excitation of guided-mode resonances in thin films of the low-loss cyclo-olefin polymer Zeonor, upon which aluminum stripe and patch arrays are patterned via standard photolithography. The filters are engineered to operate in low atmospheric loss THz spectral windows, they exhibit very high transmittance and quality factors, compact thickness, and mechanical stability. The dependence of their filtering properties on the geometrical parameters, the substrate thickness and the angle of incidence is investigated, discussing the physical limitations in their performance. This class of filters provides a cost-effective solution for broadband source or channel filtering in view of emerging terahertz wireless communication systems.
关键词： terahertz,photolithography,cyclo-olefin polymer,narrowband filters,guided-mode resonances
更新于2025-09-10 09:29:36
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Nano- and Microfabrication for Industrial and Biomedical Applications || Basic technologies for microsystems
摘要： This chapter introduces the reader the processes used to manufacture microelectronics. A silicon wafer is coated with a resist, most usually by wet deposition. Vapor deposition is also used, but high vacuum conditions are needed. The resist is a photosensitive polymer, which either cross-links or is destroyed under ultra violet (UV) light. Photolithography illuminates this resist through a pattern. The pattern is designed by computer-aided design (CAD), and copied onto a mask of borosilicate. Silicon is machined by wet chemical etching (which has precision limitations, but relatively low cost), or dry etching processes, in which its surface is bombarded with ions. Alternatively, the Bosch process uses gasses heated under low pressure to a plasma state to etch the surface. A great deal of research is under way to investigate other techniques and materials for use in microsystems. Examples include the use of powder blasting and laser ablation as etching techniques, and single-crystal (SC) quartz, amorphous glass, and thermoplastic polymers as alternatives to silicon. Thick resist lithography and locally controlled photopolymerization are techniques that could be used to create microscale features in these polymers. Since recent developments in industrial, biological, and biomedical applications particularly embrace replication technology as a means to pattern multiple parts from a master pattern or even use it for stamping biomolecular features onto a surface for the design and development of novel biological assays, it is time to introduce soft-lithography among the basic microsystems technologies together with a set of nanolithographies presented in Chapter 4.
关键词： soft-lithography,silicon micromachining,thin films,microsystems,nanolithography,photolithography
更新于2025-09-09 09:28:46
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Stability and Microbial Toxicity of HfO <sub/>2</sub> and ZrO <sub/>2</sub> Nanoparticles for Photolithography
摘要： HfO2 and ZrO2 nanoparticles (NPs) have gained attention as components of photoresists for next-generation photolithography. Coating of these NPs with organic ligands has been shown to increase their efficiency in photolithography. This study evaluated the microbial toxicity of HfO2 and ZrO2 NPs coated with benzoate, isobutyrate, or methacrylate towards heterotrophic aerobes, methanogens, and the bioluminescent bacterium, Aliivibrio fischeri. The stability of NPs in the media was assessed as a function of zeta potential, particle size distribution, and leaching analyses. NP dispersions were unstable in all bioassay media, resulting in particle aggregation and settling. Leaching tests showed that dissolution of the organic ligands from the NPs varied widely depending on the nanomaterial and medium considered. The NPs were harmless to aerobic heterotrophs and methanogens at high concentrations (800-1200 mg L-1). In contrast, they displayed low to moderate toxicity to A. fischeri (50% inhibition at 286-1372 mg L-1), with benzoate-coated NPs causing the highest inhibition. Further analyses confirmed that the inhibition observed in assays with A. fischeri should be attributed to the coated NPs rather than to the dissolved organic ligands. Overall, the NP photoresists tested in this study are unlikely to exert acute microbial toxicity at environmentally relevant concentrations (sub-ppm levels).
关键词： stability,photolithography,HfO2,ZrO2,nanoparticles,microbial toxicity,leaching
更新于2025-09-09 09:28:46
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Periodic TiO2 Nanostructures with Improved Aspect and Line/Space Ratio Realized by Colloidal Photolithography Technique
摘要： This paper presents substantial improvements of the colloidal photolithography technique (also called microsphere lithography) with the goal of better controlling the geometry of the fabricated nano-scale structures—in this case, hexagonally arranged nanopillars—printed in a layer of directly photopatternable sol-gel TiO2. Firstly, to increase the achievable structure height the photosensitive layer underneath the microspheres is deposited on a re?ective layer instead of the usual transparent substrate. Secondly, an increased width of the pillars is achieved by tilting the incident wave and using multiple exposures or substrate rotation, additionally allowing to better control the shape of the pillar’s cross section. The theoretical analysis is carried out by rigorous modelling of the photonics nanojet underneath the microspheres and by optimizing the experimental conditions. Aspect ratios (structure height/lateral structure size) greater than 2 are predicted and demonstrated experimentally for structure dimensions in the sub micrometer range, as well as line/space ratios (lateral pillar size/distance between pillars) greater than 1. These nanostructures could lead for example to materials exhibiting ef?cient light trapping in the visible and near-infrared range, as well as improved hydrophobic or photocatalytic properties for numerous applications in environmental and photovoltaic systems.
关键词： TiO2,sub-wavelength structures,sol-gel,colloidal photolithography
更新于2025-09-04 15:30:14
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25 nm Single-Crystal Silicon Nanowires Fabricated by Anisotropic Wet Etching
摘要： We report a top-down method for fabricating ultra-high aspect ratio single-crystal silicon nanowires. The fabrication method is based on the standard photolithography technique and anisotropic wet etching of the single-crystal silicon in KOH solution. SiO2 mask nanolines used for patterning single-crystal silicon nanowires are formed by the undercut etching of thin SiO2 layer in buffered hydrofluoric solution. The minimum width of the SiO2 mask nanolines are 50 nm. The length of SiO2 mask nanolines is 2 cm. The single-crystal silicon nanowires have been successfully transferred from the SiO2 mask nanolines by KOH anisotropic wet-chemical etching. The minimum width of the silicon nanowire has obtained to be 25 nm. The fabricated single-crystal silicon nanowires have trapezoidal and triangular cross sections, which are useful for applications in nanoelectronic and nanophotonic elements.
关键词： All Wet Chemical Etching,Wafer-Scale Fabrication,Single-Crystal Silicon Nanowire,Photolithography
更新于2025-09-04 15:30:14
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Multiplexed functionalization of nanoelectromechanical systems with photopatterned molecularly imprinted polymers
摘要： Implementing dedicated and reliable biochemical recognition functionalities onto nanoelectromechanical systems (NEMS) is of primary importance for their development as ultra-sensitive and highly-integrated biosensing devices. In this paper, we demonstrate the large-scale and multiplexed integration of molecularly imprinted polymers (MIPs) as highly stable biomimetic receptors onto arrays of nanocantilevers. Integration is carried out by spin-coating and photopatterning the polymer layers before releasing the nanostructures. We demonstrate that these biomimetic layers are robust enough to withstand the wet-etch of the sacrificial layer making this functionalization strategy compatible with further MEMS/NEMS processing. As a proof of concept, we fabricate NEMS resonators coated with a MIP using Boc-L-phenylalanine (Boc-L-Phe) as the template molecule. We demonstrate the preserved molecular recognition ability of the patterned sensitive layer through the fluorescence detection of dansyl-L-phenylalanine (dansyl-L-Phe), a fluorescent derivative of the template, and the mechanical integrity of the resonators by means of resonant frequency measurements.
关键词： Sensor,Molecularly Imprinted Polymer,Photolithography,Microfabrication,NanoElectroMechanical Systems
更新于2025-09-04 15:30:14