研究目的
Investigating the use of cupric oxide (CuO) films as a hole-transporting layer (HTL) material in perovskite solar cells (PSCs) to improve their electrical conductivity and stability in ambient air.
研究成果
Single-phase monoclinic CuO films with p-type conduction were successfully prepared via DC reactive magnetron sputtering, achieving a record hole mobility of 48.44 cm2/Vs. These films can be used as HTL material in PSCs, despite the current low efficiency, suggesting potential for further improvement.
研究不足
The PSCs with CuO as HTL material achieved a relatively low power conversion efficiency of 1.3%, indicating potential areas for optimization in film quality and interface properties.
1：Experimental Design and Method Selection:
Single-phase monoclinic CuO films were prepared via direct-current reactive magnetron sputtering at room temperature.
2：Sample Selection and Data Sources:
CuO films were prepared on glass slides at different O2/Ar flow ratios (Ro/a).
3：List of Experimental Equipment and Materials:
A metallic copper plate (
4：99% purity) was used as the sputtering target, with argon and oxygen gases (99% purity) as the sputtering and reactive gas, respectively. Experimental Procedures and Operational Workflow:
The glass slides were cleaned and dried before film deposition. The copper target was pre-sputtered to remove the oxide layer. CuO films were then prepared at different Ro/a values.
5：Data Analysis Methods:
The films' microstructure, optical properties, and electrical properties were characterized using XRD, SEM, spectrophotometry, Raman microscopy, and Hall effect testing.
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metallic copper plate
99.99% purity
Used as the sputtering target for preparing CuO films.
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argon gas
99.99% purity
Used as the sputtering gas.
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oxygen gas
99.99% purity
Used as the reactive gas.
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glass slides
2.5 cm × 2.5 cm, ca. 1.2 mm thickness
Sail brand
Substrate for CuO film deposition.
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mechanical pump
TRP-36
Used to pump down the vacuum chamber.
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molecular pump
KYKY
Used to maintain the vacuum in the chamber.
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DC source
Used to output voltage and current for sputtering.
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X-ray diffractometer
X’Pert PANalytical
Philips
Used to acquire XRD patterns of the films.
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field-emission scanning electron microscope
JSM–6060
Used to measure the surface structure of the films.
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spectrophotometer
UH–4150
Used to collect optical transmittance and absorbance spectra.
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Raman microscope
inVia
Renishaw
Used to measure optical phonon modes.
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Hall effect tester
ET-9000
Used to measure electrical properties.
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I-V measurement platform
PT-IVM3S+
Pharos Technology
Used to measure the J-V curve of solar cells.
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