研究目的
To verify the influence of silver element on the recrystallization process and optical-electric properties of CIS films.
研究成果
Annealing improves crystal quality of CIS films, with Ag doping promoting recrystallization and phase transition to CH phase. Optimal properties were achieved at 450°C annealing for Ag-doped films in N2 atmosphere, showing enhanced optical-electrical properties and high photocurrent. Ag atoms increase grain size and band gap, making them suitable for solar cell applications.
研究不足
The study is limited to specific annealing conditions and Ag doping levels; variations in atmosphere and temperature may not cover all possible scenarios. The use of polycrystalline films and potential defects could affect reproducibility. Equipment sensitivity and measurement errors might influence results.
1:Experimental Design and Method Selection:
The study used single-source thermal evaporation for film deposition and annealing in vacuum or N2 atmosphere to investigate phase transitions and properties. Theoretical models included XRD, Raman spectroscopy, and electrical measurements to analyze crystal structure and carrier transport.
2:Sample Selection and Data Sources:
CIS polycrystalline ingot was grown using the vertical Bridgman method from high-purity elements (Cu, In, S). Films were deposited on quartz glass substrates, with Ag doping at 5 at% for some samples.
3:List of Experimental Equipment and Materials:
Equipment included XRD (D/MAX-3C), SEM (JEOL JSM-6700F), EDS, UV–vis–IR spectrometer (UH4150), Keithley 4200-SCS semiconductor parameter analyzer, Lab RAM HR800UV Raman spectrometer, and 660E electrochemical workstation. Materials included quartz glass substrates, Cu (99.999%), In (99.999%), S (99.7%), and Ag powder.
4:999%), In (999%), S (7%), and Ag powder. Experimental Procedures and Operational Workflow:
4. Experimental Procedures and Operational Workflow: Films were deposited under 10^{-3} Pa pressure, annealed at temperatures from 350°C to 550°C in vacuum or N2. Characterization involved XRD for phase analysis, SEM for morphology, EDS for composition, UV–vis for optical properties, I-V and C-V for electrical properties, and Raman for structural analysis.
5:Characterization involved XRD for phase analysis, SEM for morphology, EDS for composition, UV–vis for optical properties, I-V and C-V for electrical properties, and Raman for structural analysis. Data Analysis Methods:
5. Data Analysis Methods: Data were analyzed using Scherrer formula for grain size, Harris texture coefficient for crystal quality, and Mott-Schottky equation for carrier concentration. Statistical analysis included plotting absorption coefficients and calculating band gaps.
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Scanning Electron Microscope
JSM-6700F
JEOL
Used to characterize the surface morphology of the CIS thin films.
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Semiconductor Parameter Analyzer
4200-SCS
Keithley
Used to measure resistance characteristics and I-V performances of the films.
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X-ray Diffractometer
D/MAX-3C
Not specified
Used to determine the phase and structure of CIS thin films by analyzing XRD patterns.
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UV–vis–IR Spectrometer
UH4150
Not specified
Used to measure absorption and reflection spectra in the wavelength range from 200 nm to 1000 nm.
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Raman Spectrometer
Lab RAM HR800UV
Not specified
Used for micro-Raman spectra measurements with 514.5 nm excitation line.
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Electrochemical Workstation
660E
Not specified
Used to measure I-V curves, C-V curves, and I-t spectra in a three-electrode system.
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Light Source
LE-SP-XE150 series
Not specified
Used for light illumination in photocurrent measurements with 150 mW/cm2 density.
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