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AIP Conference Proceedings [Author(s) THE 3RD INTERNATIONAL CONFERENCE ON OPTOELECTRONIC AND NANO MATERIALS FOR ADVANCED TECHNOLOGY (icONMAT 2019) - Kerala, India (3–5 January 2019)] - Effect of substrate temperature on spray coated PEDOT:PSS thin film morphology for organic solar cell
摘要： The effect of substrate temperature on the spray coated poly (3,4-ethylenedioxythiophene): poly (styrenesulfonic acid) (PEDOT: PSS) hole transport layer (HTL) is explored in terms of morphological, electrical and photovoltaic characterization. The substrate temperature is varied in three steps 100, 150 and 200°C during the spray deposition of PEDOT: PSS thin film layer. Scanning electron microscopy (SEM) and optical microscopy images reveal that for the substrate temperatures of 100°C and 150°C, the morphology of PEDOT: PSS layer is improved and further increasing the temperature to 200°C, voids and cracks are formed in the films. These voids and cracks influence the conductivity of PEDOT: PSS layer which reduces from 4.7 for 150°C to 3.9 S/cm for 200°C. Organic solar cells (OSCs) using PTB7:PC71BM absorber layer on the spray coated PEDOT:PSS HTL show an efficiency increase from 2.34 for 100°C to 2.88% for 150°C and then decrease to 1.88% for 200°C.
关键词： substrate temperature,spray coating,PEDOT:PSS,morphology,organic solar cells
更新于2025-10-22 19:40:53
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Influence of substrate and substrate temperature on the structural, optical and surface properties of InGaN thin films prepared by RFMS method
摘要： In this work, the pure InGaN thin films were grown using n-type and p-type silicon substrates at varying substrate temperatures using the sputtering method. The effects of substrate and substrate temperature on the structural, morphological and optical properties of the thin films grown were investigated. X-ray diffraction (XRD) analyzes of the obtained films illustrates crystal structures at C substrate temperature, the films were found to be hexagonal. Scanning electron microscopy (SEM) was used to investigate the shape, size and surface distribution of the particles formed on film surfaces. The reflection and optical band gap (Eg) of the films were investigated from the optical analyzes taken with the UV-VIS spectrophotometer. As a result of these analyzes, it has been reached that the substrate and substrate temperature have a great influence on the structural, morphological and optical properties of the films. The experimental findings obtained in the study are compared with the studies given in the literature and the similarities and differences are discussed.
关键词： InGaN growth,silicon substrate,thin films,sputtering technique,substrate temperature
更新于2025-09-23 15:23:52
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Effect of structures and substrate temperatures on BaZn0.06Bi0.94O3- perovskite-based NTC thermistor thin films
摘要： Negative temperature coefficient (NTC) thermistor thin films based on perovskite-type BaBiO3 (BB) and BaZn0.06Bi0.94O3-δ (BZB) were successfully prepared by radio frequency (RF) magnetron sputtering method on Pt substrate. The crystal structure and grain morphology of the BZB and BB films deposited at different substrate temperatures (25–200 °C and 200 °C, respectively) were examined by X-ray diffraction (XRD) and atomic force microscope (AFM). The substrate temperature had a significant influence on the crystallinity and phase structure, in which the main crystalline phases with the cubic and tetragonal BaBiO3-based perovskite structures could be obtained on the substrate temperatures of 100 °C and 200 °C, respectively. On the other hand, the electrical properties were analyzed by measuring the resistance temperature (ρ-T) characteristics, and all the thin films exhibited good NTC thermistor characteristics. In addition, the grain (Rg) and grain boundary (Rgb) contribution to the total resistance were estimated by three parallel R-CPE equivalent circuits in series, in which the main contribution of resistance for BZB thin film deposited at 200 °C was derived from Rg response rather than that in Rgb at the higher temperature range. This was one of the most important reasons why this sample had a good NTC behavior, and this result was confirmed by the current-voltage (I-V) characteristics analysis. For the BB film, the room-temperature resistivity (ρ25) was 1540 Ω cm (B25/85 –3240 K), while the ρ25 value decreased to approximately 1156 Ω cm (B25/85 –3183 K) for BZB film deposited at a same substrate temperature (200 °C). This is mainly due to the change in crystal structural characteristics. It is believed that the substitution of Zn2+ for BB thin films deposited at an appropriate temperature will be useful for low-resistance applications as novel thin film NTC thermistors.
关键词： Substrate temperature,NTC thermistor,Electrical properties,BaBiO3,Thin film
更新于2025-09-23 15:23:52
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Longtime stability of silver-based SERS substrate in the environment and (bio)environment with variable temperature and humidity
摘要： The increased involving of Surface Enhanced Raman Spectroscopy (SERS) in the analytical and bioanalytical field makes this technique commercially available. However, the growing range of available SERS substrates opens the question regarding the stability of SERS substrates during their storage, transportation, and utilization. In this paper, we present systematical study of the stability of SERS enhanced response of SERS-active silver grating under various physical and chemical loads. The silver coated periodical gratings provide excellent enhancement and reproducibility of SERS signal, achieved at the macroscale. The substrate load procedures include the temperature, humidity tests, and their combination. Since the utilization of SERS substrates often involves their interaction with various (bio)environments, the effects of physiological media were studied too. In all cases, the effects of the loads were determined from the changes of SERS effectivity and reproducibility.
关键词： SERS,Substrate,Temperature,(Bio)environment,Stability,Humidity
更新于2025-09-23 15:23:52
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Effects of substrate temperature and precursor amount on optical properties and microstructure of CVD deposited amorphous TiO2 thin films
摘要： In this research, TiO2 thin films were deposited on glass substrate by chemical vapor deposition using tetra isopropylorthotitanate as a precursor at low temperature. The TiO2 thin films were formed without using an oxygen source or annealing. Effects of substrate temperature and amount of the precursor on surface microstructure and optical properties of deposited TiO2 thin films were investigated. X-ray diffraction (XRD), UV-visible spectrophotometry and atomic force microscopy (AFM) were used to analyze the fabricated layers. The XRD analysis revealed that structure of all prepared layers was in amorphous phase. Analysis of AFM images showed that by increasing substrate temperature, the layer surfaces became rougher and simultaneously nanoparticle size was more uniform. Texture analysis revealed that increasing substrate temperature and decreasing precursor amount both increased surface isotropy. Thickness of layers was calculated by applying the Swanepoel method to the transmittance spectra. Variations in optical parameters were studied, including of optical band gap, refractive index, extinction coefficient, complex dielectric function, Urbach energy, single oscillator energy and dispersion energy. The results indicated that optical properties were functions of substrate temperature and precursor amount.
关键词： CVD,TiO2 thin film,Substrate temperature,Optical properties,Amorphous structure
更新于2025-09-23 15:22:29
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Effect of temperature and bias voltage on electrical and electrochemical properties of diamond-like carbon films deposited with HiPIMS
摘要： The relatively high electrical resistivity of diamond-like carbon (DLC) film is one of the main drawbacks when applied in electronic device. In this study, DLC films were synthesized on 304 stainless steels by high power impulse magnetron sputtering (HiPIMS) process and the effect of deposition temperature and bias voltage on the microstructure, electrical and electrochemical properties, hardness and adhesion strength of the DLC films were investigated. The sp2/sp3 ratio of DLC films first decreased then increased and the surface became denser as bias voltage increasing from 0 to -400 V. While the film turned into graphite-like structure and became incompact when deposition temperature rose from 100 °C to 300 °C. The interfacial contact resistance (ICR) got reduced by increasing bias voltage and deposition temperature. However, as the deposition temperature increased to 300 °C the anticorrosion ability and hardness of DLC films deteriorated. The DLC films deposited at 300 °C presented soft and had better adhesion strength than hard DLC films deposited at 100 °C. DLC films deposited at -400 V bias and 300 °C had the lowest ICR while DLC films deposited at -400 V bias and 100 °C had the best performance when ICR, corrosion resistance and hardness were all taken into consideration.
关键词： Electrochemical corrosion,Substrate temperature,High power impulse magnetron sputtering,Interfacial conductivity,Diamond-like carbon,Bias voltages
更新于2025-09-23 15:22:29
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[IEEE 2019 4th International Conference on Electrical Information and Communication Technology (EICT) - Khulna, Bangladesh (2019.12.20-2019.12.22)] 2019 4th International Conference on Electrical Information and Communication Technology (EICT) - Effect of growth temperature on the structural and optical properties of CdS:O thin films for CdTe solar cells
摘要： Oxygenated Cadmium Sulfide (CdS:O) is used as a window layer for high-performance CdTe thin-film solar cells. In this work, the effect of growth temperature on the physical properties of (CdS:O) layer is reported. The CdS:O layer was synthesized on commercially available soda-lime glass (SLG) by using a reactive radio frequency (RF) sputtering in 1.5% oxygen (O2)/argon (Ar) ambient as a function of substrate temperature (25 °C to 300 °C). The structural and optical properties of the as-grown CdS:O thin films were carried out by X-ray diffraction and UV-VIS-Spectroscopy respectively. The XRD patterns revealed intriguing structural natures of the deposited films such as amorphous/semi-amorphous nature in the substrate temperature range 25 – 150 °C, then polycrystalline nature in the range 200 – 250 °C and again amorphous nature at 300 °C. The transmission spectra exhibited higher optical transmission in the visible wavelength which signifies the enhancement of photo generated current of CdTe solar cells. The bandgap of room temperature (RT) deposited CdS:O thin film for 1.5% O2/Ar was found to be increased 12.50% in comparison with CdS film deposited in pure Ar ambient. Besides, the bandgap of CdS:O films for 1.5% O2/Ar was decreased with the increase of the substrate temperature. Thus, it has been concluded that the CdS:O thin film deposited at RT found to be better for CdTe solar cell application.
关键词： optical bandgap,substrate temperature,CdTe,rf-sputtering,O2/Ar ratio,Crystallite size,CdS:O
更新于2025-09-23 15:21:01
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Effect of substrate temperature on the properties of RF sputtered CdS thin films for solar cell applications
摘要： We report the effect of substrate temperature (25–300 °C) on the structural, optical and electrical properties of Cadmium Sulphide (CdS) thin films deposited onto glass substrate by Radio Frequency (RF) magnetron sputtering. The structural, morphological, optical and electrical properties of the films were characterized by X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM), UV–VIS-NIR spectroscopy and Hall Effect measurement respectively. The XRD studies showed that the films were polycrystalline with hexagonal wurtzite structure preferentially oriented along the (0 0 2) plane parallel to the substrate surface. The XRD data analysis further revealed the crystallite size of the nanocrystalline films i.e. 22–24 nm exhibiting the fact that crystallite size increased with increasing the substrate temperature. The FE-SEM images along with energy dispersive spectroscopy (EDS) studies confirmed the homogeneous, compact and pin-hole free surface morphology. The UV–VIS-NIR studies unveiled the optical transmittance in the range of 75–90% after 540 nm of the wavelength of light. The optical band gaps were found to be decreasing from 2.34 eV to 2.26 eV with increasing the substrate temperature. The films were characterized as n-type as evidenced by the Hall Effect measurement. The carrier mobility was found to be increasing gradually from 5.53 to 12.57 cm2/V·s by increasing the substrate temperature from room temperature to 300 °C due to the improvement of crystalline quality and grain size of the films. The results showed good optical and electrical properties of the films deposited at 300 °C which are suitable to use as window layer in thin film based solar cells.
关键词： CdS,UV–VIS-NIR,XRD,Hall effect measurement,Thin films,Substrate temperature,RF sputtering
更新于2025-09-23 15:21:01
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Effect of substrate temperature on bismuth oxide thin films grown by pulsed laser deposition
摘要： We present and discuss on bismuth oxide films grown on cost-efficient BK7 glass slides by pulsed laser deposition using a metallic target. Our choice is of particular interest due to the high number of intermediate bismuth oxides that can form during the oxidation process, along with the polymorphs of the stoichiometric oxide, i.e. bismuth trioxide (Bi2O3). We show that the oxidation degree of bismuth increases with substrate temperature, tS (300-600 °C), when grown in 100 sccm flow at 6 × 10?1 mbar O2 partial pressure. Thin film crystallinity is also increased with tS, as expected. Instead, the refractive index (n) of the films decreases in the visible range, as tS is increased. Furthermore, the transmittance of the films increases with tS to over 60%, especially in the red and near-infrared region (above 600 nm). As a final point, the results are discussed and compared to literature.
关键词： Wemple-DiDomenico model,Optical properties,Thin films,Laser processing,Substrate temperature
更新于2025-09-23 15:21:01
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Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
摘要： In this work, the effect of plasma on the chemistry and morphology of coatings deposited by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition (AP-PECVD) is investigated. To do so, plasma deposited amorphous titanium dioxide (TiO2) thin films are compared to thin films deposited using Atmospheric Pressure Chemical Vapor Deposition (AP-CVD) not involving the use of plasma. We focus here on the effect and the interest of plasma in the AP-PECVD process over AP-CVD for low substrate temperature deposition. The advantages of AP-PECVD over AP-CVD are often suggested in many articles however no direct evidence of the role of the plasma for TiO2 deposition at atmospheric pressure was reported. Hence, herein, the deposition via both methods is directly compared by depositing coatings with and without plasma using the same CVD reactor. Through the control of the plasma parameters, we are able to form low carbon coatings at low temperature with a deposition rate twice faster than AP-CVD, clearly showing the interest of plasma. Plasma enhanced methods are promising for the deposition of coatings at industrial scale over large surface and at high rate.
关键词： AP-PECVD,TiO2 thin films,Atmospheric Pressure Chemical Vapor Deposition,Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition,plasma,AP-CVD,low substrate temperature deposition
更新于2025-09-23 15:21:01